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Article: Wear resistance of NiTi alloy after surface mechanical attrition treatment

TitleWear resistance of NiTi alloy after surface mechanical attrition treatment
Authors
KeywordsGrain refinement
Nickel titanium shape memory alloy (NiTi SMA)
Surface mechanical attrition treatment (SMAT)
Ultrafine grain
Wear resistance
Issue Date2010
PublisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/surfcoat
Citation
Surface And Coatings Technology, 2010, v. 205 n. 2, p. 506-510 How to Cite?
AbstractAn ultrafine grain layer consisting of nanocrystallites as well as submicrometer grains is produced on NiTi shape memory alloy by surface mechanical attrition treatment (SMAT) and the effects of the ultrafine grain layer on the tribological properties are investigated under dry sliding conditions. Compared to the coarse grain (CG) NiTi, the SMAT NiTi has smaller friction coefficients and improved wear resistance at applied loads from 5 to 15. N due to the grain refinement effect. Examination of the worn surfaces indicates that materials delamination and particles co-exist on both the CG and SMAT NiTi samples. Our results indicate that delamination is the main wear mechanism on CG NiTi whereas abrasive particles dominate the wear process on SMAT NiTi. © 2010 Elsevier B.V.
Persistent Identifierhttp://hdl.handle.net/10722/139545
ISSN
2015 Impact Factor: 2.139
2015 SCImago Journal Rankings: 0.872
ISI Accession Number ID
Funding AgencyGrant Number
City University of Hong Kong Strategic Research Grant (SRG)7008009
Funding Information:

This work was supported by City University of Hong Kong Strategic Research Grant (SRG) No. 7008009. T. Hu is grateful for the experimental help by Dr. Z.F. Zhou and Mr. W.L. Cheng in the Department of Mechanical Engineering and Engineering Management in the City University of Hong Kong.

References

 

DC FieldValueLanguage
dc.contributor.authorHu, Ten_HK
dc.contributor.authorWen, CSen_HK
dc.contributor.authorSun, GYen_HK
dc.contributor.authorWu, SLen_HK
dc.contributor.authorChu, CLen_HK
dc.contributor.authorWu, ZWen_HK
dc.contributor.authorLi, GYen_HK
dc.contributor.authorLu, Jen_HK
dc.contributor.authorYeung, KWKen_HK
dc.contributor.authorChu, PKen_HK
dc.date.accessioned2011-09-23T05:51:31Z-
dc.date.available2011-09-23T05:51:31Z-
dc.date.issued2010en_HK
dc.identifier.citationSurface And Coatings Technology, 2010, v. 205 n. 2, p. 506-510en_HK
dc.identifier.issn0257-8972en_HK
dc.identifier.urihttp://hdl.handle.net/10722/139545-
dc.description.abstractAn ultrafine grain layer consisting of nanocrystallites as well as submicrometer grains is produced on NiTi shape memory alloy by surface mechanical attrition treatment (SMAT) and the effects of the ultrafine grain layer on the tribological properties are investigated under dry sliding conditions. Compared to the coarse grain (CG) NiTi, the SMAT NiTi has smaller friction coefficients and improved wear resistance at applied loads from 5 to 15. N due to the grain refinement effect. Examination of the worn surfaces indicates that materials delamination and particles co-exist on both the CG and SMAT NiTi samples. Our results indicate that delamination is the main wear mechanism on CG NiTi whereas abrasive particles dominate the wear process on SMAT NiTi. © 2010 Elsevier B.V.en_HK
dc.languageengen_US
dc.publisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/surfcoaten_HK
dc.relation.ispartofSurface and Coatings Technologyen_HK
dc.subjectGrain refinementen_HK
dc.subjectNickel titanium shape memory alloy (NiTi SMA)en_HK
dc.subjectSurface mechanical attrition treatment (SMAT)en_HK
dc.subjectUltrafine grainen_HK
dc.subjectWear resistanceen_HK
dc.titleWear resistance of NiTi alloy after surface mechanical attrition treatmenten_HK
dc.typeArticleen_HK
dc.identifier.emailYeung, KWK:wkkyeung@hkucc.hku.hken_HK
dc.identifier.authorityYeung, KWK=rp00309en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.surfcoat.2010.07.023en_HK
dc.identifier.scopuseid_2-s2.0-77956477905en_HK
dc.identifier.hkuros192177en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-77956477905&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume205en_HK
dc.identifier.issue2en_HK
dc.identifier.spage506en_HK
dc.identifier.epage510en_HK
dc.identifier.isiWOS:000282542300040-
dc.publisher.placeSwitzerlanden_HK
dc.identifier.scopusauthoridHu, T=25948400300en_HK
dc.identifier.scopusauthoridWen, CS=7201367133en_HK
dc.identifier.scopusauthoridSun, GY=15129334300en_HK
dc.identifier.scopusauthoridWu, SL=15125218800en_HK
dc.identifier.scopusauthoridChu, CL=7404345713en_HK
dc.identifier.scopusauthoridWu, ZW=16551433100en_HK
dc.identifier.scopusauthoridLi, GY=7407051114en_HK
dc.identifier.scopusauthoridLu, J=36072284900en_HK
dc.identifier.scopusauthoridYeung, KWK=13309584700en_HK
dc.identifier.scopusauthoridChu, PK=36040705700en_HK

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