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Conference Paper: Fabrication of titania film on NiTi alloy by a deposition-assisted advanced oxidation method
Title | Fabrication of titania film on NiTi alloy by a deposition-assisted advanced oxidation method |
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Authors | |
Keywords | Deposition-assisted advanced oxidation NiTi Shape memory alloy Titania film |
Issue Date | 2008 |
Publisher | Trans Tech Publications Ltd.. The Journal's web site is located at http://www.scitec.ch/1022-6680/ |
Citation | The 2008 International Conference on Multifunctional Materials and Structures; Hong Kong, China; 28-31 July 2008. In Advanced Materials Research, 2008, v. 47-50 pt. 1, p. 310-313 How to Cite? |
Abstract | A graded titania film was formed on chemically polished NiTi shape memory alloy (SMA) by a novel deposition-assisted advanced oxidation method in a modified Fenton's reagent containing titanium tetrachloride and then characterized by SEM and XPS. The effects of the titania film on leaching of harmful Ni ions from the NiTi substrate in simulated body fluids (SBF) is assessed by inductively-coupled plasma mass spectrometry (ICPMS). The results indicate that a thick and dense titania film was successfully fabricated in this in situ advanced oxidation reaction assisted with an additional deposition process by the hydrolysis of titanium tetrachloride on NiTi. The titania film can dramatically reduces Ni leaching from NiTi. XPS depth profiles show that the film possesses a smooth graded interfacial structure that boost mechanical stability. © 2008 Trans Tech Publications. |
Description | Conference Theme: Multi-functional Materials and Structures |
Persistent Identifier | http://hdl.handle.net/10722/139537 |
ISSN | |
References |
DC Field | Value | Language |
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dc.contributor.author | Chu, CL | en_HK |
dc.contributor.author | Hu, T | en_HK |
dc.contributor.author | Wu, SL | en_HK |
dc.contributor.author | Chung, CY | en_HK |
dc.contributor.author | Yeung, KWK | en_HK |
dc.contributor.author | Chu, PK | en_HK |
dc.date.accessioned | 2011-09-23T05:51:23Z | - |
dc.date.available | 2011-09-23T05:51:23Z | - |
dc.date.issued | 2008 | en_HK |
dc.identifier.citation | The 2008 International Conference on Multifunctional Materials and Structures; Hong Kong, China; 28-31 July 2008. In Advanced Materials Research, 2008, v. 47-50 pt. 1, p. 310-313 | en_US |
dc.identifier.issn | 1022-6680 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/139537 | - |
dc.description | Conference Theme: Multi-functional Materials and Structures | - |
dc.description.abstract | A graded titania film was formed on chemically polished NiTi shape memory alloy (SMA) by a novel deposition-assisted advanced oxidation method in a modified Fenton's reagent containing titanium tetrachloride and then characterized by SEM and XPS. The effects of the titania film on leaching of harmful Ni ions from the NiTi substrate in simulated body fluids (SBF) is assessed by inductively-coupled plasma mass spectrometry (ICPMS). The results indicate that a thick and dense titania film was successfully fabricated in this in situ advanced oxidation reaction assisted with an additional deposition process by the hydrolysis of titanium tetrachloride on NiTi. The titania film can dramatically reduces Ni leaching from NiTi. XPS depth profiles show that the film possesses a smooth graded interfacial structure that boost mechanical stability. © 2008 Trans Tech Publications. | en_HK |
dc.language | eng | en_US |
dc.publisher | Trans Tech Publications Ltd.. The Journal's web site is located at http://www.scitec.ch/1022-6680/ | en_HK |
dc.relation.ispartof | Advanced Materials Research | en_HK |
dc.subject | Deposition-assisted advanced oxidation | en_HK |
dc.subject | NiTi | en_HK |
dc.subject | Shape memory alloy | en_HK |
dc.subject | Titania film | en_HK |
dc.title | Fabrication of titania film on NiTi alloy by a deposition-assisted advanced oxidation method | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.email | Yeung, KWK:wkkyeung@hkucc.hku.hk | en_HK |
dc.identifier.authority | Yeung, KWK=rp00309 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.4028/www.scientific.net/AMR.47-50.310 | - |
dc.identifier.scopus | eid_2-s2.0-56349129610 | en_HK |
dc.identifier.hkuros | 192166 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-56349129610&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 47-50 pt. 1 | en_HK |
dc.identifier.spage | 310 | en_HK |
dc.identifier.epage | 313 | en_HK |
dc.publisher.place | Switzerland | en_HK |
dc.identifier.scopusauthorid | Chu, CL=7404345713 | en_HK |
dc.identifier.scopusauthorid | Hu, T=25948400300 | en_HK |
dc.identifier.scopusauthorid | Wu, SL=15125218800 | en_HK |
dc.identifier.scopusauthorid | Chung, CY=8100842800 | en_HK |
dc.identifier.scopusauthorid | Yeung, KWK=13309584700 | en_HK |
dc.identifier.scopusauthorid | Chu, PK=36040705700 | en_HK |
dc.customcontrol.immutable | sml 170331 amended | - |
dc.identifier.issnl | 1022-6680 | - |