File Download
There are no files associated with this item.
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1016/j.nimb.2005.05.030
- Scopus: eid_2-s2.0-23644434982
- WOS: WOS:000231543000077
- Find via
Supplementary
- Citations:
- Appears in Collections:
Article: Improvements of anti-corrosion and mechanical properties of NiTi orthopedic materials by acetylene, nitrogen and oxygen plasma immersion ion implantation
Title | Improvements of anti-corrosion and mechanical properties of NiTi orthopedic materials by acetylene, nitrogen and oxygen plasma immersion ion implantation |
---|---|
Authors | |
Keywords | Corrosion resistance Diffusion barrier NiTi shape memory alloys Plasma immersion ion implantation |
Issue Date | 2005 |
Publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/nimb |
Citation | Nuclear Instruments And Methods In Physics Research, Section B: Beam Interactions With Materials And Atoms, 2005, v. 237 n. 1-2, p. 411-416 How to Cite? |
Abstract | Nickel-titanium shape memory alloys (NiTi) are useful materials in orthopedics and orthodontics due to their unique super-elasticity and shape memory effects. However, the problem associated with the release of harmful Ni ions to human tissues and fluids has been raising safety concern. Hence, it is necessary to produce a surface barrier to impede the out-diffusion of Ni ions from the materials. We have conducted acetylene, nitrogen and oxygen plasma immersion ion implantation (PIII) into NiTi alloys in an attempt to improve the surface properties. All the implanted and annealed samples surfaces exhibit outstanding corrosion and Ni out-diffusion resistance. Besides, the implanted layers are mechanically stronger than the substrate underneath. XPS analyses disclose that the layer formed by C2H2 PIII is composed of mainly TiCx with increasing Ti to C concentration ratios towards the bulk. The nitrogen PIII layer is observed to be TiN, whereas the oxygen PIII layer is composed of oxides of Ti4+, Ti3+ and Ti 2+. © 2005 Elsevier B.V. All rights reserved. |
Persistent Identifier | http://hdl.handle.net/10722/139530 |
ISSN | 2023 Impact Factor: 1.4 2023 SCImago Journal Rankings: 0.366 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Poon, RWY | en_HK |
dc.contributor.author | Ho, JPY | en_HK |
dc.contributor.author | Liu, X | en_HK |
dc.contributor.author | Chung, CY | en_HK |
dc.contributor.author | Chu, PK | en_HK |
dc.contributor.author | Yeung, KWK | en_HK |
dc.contributor.author | Lu, WW | en_HK |
dc.contributor.author | Cheung, KMC | en_HK |
dc.date.accessioned | 2011-09-23T05:51:15Z | - |
dc.date.available | 2011-09-23T05:51:15Z | - |
dc.date.issued | 2005 | en_HK |
dc.identifier.citation | Nuclear Instruments And Methods In Physics Research, Section B: Beam Interactions With Materials And Atoms, 2005, v. 237 n. 1-2, p. 411-416 | en_HK |
dc.identifier.issn | 0168-583X | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/139530 | - |
dc.description.abstract | Nickel-titanium shape memory alloys (NiTi) are useful materials in orthopedics and orthodontics due to their unique super-elasticity and shape memory effects. However, the problem associated with the release of harmful Ni ions to human tissues and fluids has been raising safety concern. Hence, it is necessary to produce a surface barrier to impede the out-diffusion of Ni ions from the materials. We have conducted acetylene, nitrogen and oxygen plasma immersion ion implantation (PIII) into NiTi alloys in an attempt to improve the surface properties. All the implanted and annealed samples surfaces exhibit outstanding corrosion and Ni out-diffusion resistance. Besides, the implanted layers are mechanically stronger than the substrate underneath. XPS analyses disclose that the layer formed by C2H2 PIII is composed of mainly TiCx with increasing Ti to C concentration ratios towards the bulk. The nitrogen PIII layer is observed to be TiN, whereas the oxygen PIII layer is composed of oxides of Ti4+, Ti3+ and Ti 2+. © 2005 Elsevier B.V. All rights reserved. | en_HK |
dc.language | eng | en_US |
dc.publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/nimb | en_HK |
dc.relation.ispartof | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | en_HK |
dc.subject | Corrosion resistance | en_HK |
dc.subject | Diffusion barrier | en_HK |
dc.subject | NiTi shape memory alloys | en_HK |
dc.subject | Plasma immersion ion implantation | en_HK |
dc.title | Improvements of anti-corrosion and mechanical properties of NiTi orthopedic materials by acetylene, nitrogen and oxygen plasma immersion ion implantation | en_HK |
dc.type | Article | en_HK |
dc.identifier.openurl | http://library.hku.hk:4550/resserv?sid=HKU:IR&issn=0168-583X&volume=237&issue=1-2&spage=411&epage=416&date=2006&atitle=Improvements+of+anti-corrosion+and+mechanical+properties+of+NiTi+orthopedic+materials+by+acetylene,+nitrogen+and+oxygen+plasma+immersion+ion+implantation | - |
dc.identifier.email | Yeung, KWK:wkkyeung@hkucc.hku.hk | en_HK |
dc.identifier.email | Lu, WW:wwlu@hku.hk | en_HK |
dc.identifier.email | Cheung, KMC:cheungmc@hku.hk | en_HK |
dc.identifier.authority | Yeung, KWK=rp00309 | en_HK |
dc.identifier.authority | Lu, WW=rp00411 | en_HK |
dc.identifier.authority | Cheung, KMC=rp00387 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.nimb.2005.05.030 | en_HK |
dc.identifier.scopus | eid_2-s2.0-23644434982 | en_HK |
dc.identifier.hkuros | 192135 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-23644434982&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 237 | en_HK |
dc.identifier.issue | 1-2 | en_HK |
dc.identifier.spage | 411 | en_HK |
dc.identifier.epage | 416 | en_HK |
dc.identifier.isi | WOS:000231543000077 | - |
dc.publisher.place | Netherlands | en_HK |
dc.identifier.scopusauthorid | Poon, RWY=34572161800 | en_HK |
dc.identifier.scopusauthorid | Ho, JPY=7402650045 | en_HK |
dc.identifier.scopusauthorid | Liu, X=8603933800 | en_HK |
dc.identifier.scopusauthorid | Chung, CY=8100842800 | en_HK |
dc.identifier.scopusauthorid | Chu, PK=36040705700 | en_HK |
dc.identifier.scopusauthorid | Yeung, KWK=13309584700 | en_HK |
dc.identifier.scopusauthorid | Lu, WW=7404215221 | en_HK |
dc.identifier.scopusauthorid | Cheung, KMC=7402406754 | en_HK |
dc.identifier.issnl | 0168-583X | - |