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postgraduate thesis: Efficient finite-difference schemes in thermal analysis and inverse lithography for integrated circuit manufacturing

TitleEfficient finite-difference schemes in thermal analysis and inverse lithography for integrated circuit manufacturing
Authors
Advisors
Advisor(s):Wong, NLam, EYM
Issue Date2010
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
Citation
Shen, Y. [沈逸江]. (2010). Efficient finite-difference schemes in thermal analysis and inverse lithography for integrated circuit manufacturing. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4545504
DegreeDoctor of Philosophy
SubjectFinite differences.
Integrated circuits - Testing.
Integrated circuits - Thermal properties.
Integrated circuits - Design and construction - Mathematics.
Dept/ProgramElectrical and Electronic Engineering
Persistent Identifierhttp://hdl.handle.net/10722/132960
HKU Library Item IDb4545504

 

DC FieldValueLanguage
dc.contributor.advisorWong, N-
dc.contributor.advisorLam, EYM-
dc.contributor.authorShen, Yijiang.-
dc.contributor.author沈逸江.-
dc.date.issued2010-
dc.identifier.citationShen, Y. [沈逸江]. (2010). Efficient finite-difference schemes in thermal analysis and inverse lithography for integrated circuit manufacturing. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4545504-
dc.identifier.urihttp://hdl.handle.net/10722/132960-
dc.languageeng-
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)-
dc.relation.ispartofHKU Theses Online (HKUTO)-
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.-
dc.rightsThis work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.-
dc.source.urihttp://hub.hku.hk/bib/B45455041-
dc.subject.lcshFinite differences.-
dc.subject.lcshIntegrated circuits - Testing.-
dc.subject.lcshIntegrated circuits - Thermal properties.-
dc.subject.lcshIntegrated circuits - Design and construction - Mathematics.-
dc.titleEfficient finite-difference schemes in thermal analysis and inverse lithography for integrated circuit manufacturing-
dc.typePG_Thesis-
dc.identifier.hkulb4545504-
dc.description.thesisnameDoctor of Philosophy-
dc.description.thesislevelDoctoral-
dc.description.thesisdisciplineElectrical and Electronic Engineering-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.5353/th_b4545504-
dc.date.hkucongregation2011-
dc.identifier.mmsid991031541749703414-

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