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Article: Effect of O2 adsorption on electron scattering at Cu(001) surfaces

TitleEffect of O2 adsorption on electron scattering at Cu(001) surfaces
Authors
KeywordsAdsorption
Electron Energy Loss Spectroscopy
Monolayers
Issue Date2010
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 2010, v. 97 n. 13 How to Cite?
AbstractThe electrical resistance of epitaxial Cu(001) sequentially increases, decreases, and again increases when exposed to 10-3 - 105 Pa s of O2. This is attributed to partial specular surface scattering for smooth clean Cu(001) and for the surface with a complete adsorbed monolayer, but diffuse scattering at partial coverage and after chemical oxidation. A model relates the surface coverage to the specularity parameter and finds adatom and advacancy scattering cross-sections of 0.8±0.2 and 0.06±0.03 nm2, which are qualitatively validated by nonequilibrium ab initio transport simulations. The rates for resistance change are proportional to the O2 partial pressure. © 2010 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/132520
ISSN
2015 Impact Factor: 3.142
2015 SCImago Journal Rankings: 1.105
ISI Accession Number ID
Funding AgencyGrant Number
NYSTAR Interconnect Focus Center at Rensselaer
Funding Information:

This research is supported by the NYSTAR Interconnect Focus Center at Rensselaer.

References

 

DC FieldValueLanguage
dc.contributor.authorChawla, JSen_HK
dc.contributor.authorZahid, Fen_HK
dc.contributor.authorGuo, Hen_HK
dc.contributor.authorGall, Den_HK
dc.date.accessioned2011-03-28T09:25:47Z-
dc.date.available2011-03-28T09:25:47Z-
dc.date.issued2010en_HK
dc.identifier.citationApplied Physics Letters, 2010, v. 97 n. 13en_HK
dc.identifier.issn0003-6951en_HK
dc.identifier.urihttp://hdl.handle.net/10722/132520-
dc.description.abstractThe electrical resistance of epitaxial Cu(001) sequentially increases, decreases, and again increases when exposed to 10-3 - 105 Pa s of O2. This is attributed to partial specular surface scattering for smooth clean Cu(001) and for the surface with a complete adsorbed monolayer, but diffuse scattering at partial coverage and after chemical oxidation. A model relates the surface coverage to the specularity parameter and finds adatom and advacancy scattering cross-sections of 0.8±0.2 and 0.06±0.03 nm2, which are qualitatively validated by nonequilibrium ab initio transport simulations. The rates for resistance change are proportional to the O2 partial pressure. © 2010 American Institute of Physics.en_HK
dc.languageengen_US
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/en_HK
dc.relation.ispartofApplied Physics Lettersen_HK
dc.subjectAdsorptionen_US
dc.subjectElectron Energy Loss Spectroscopyen_US
dc.subjectMonolayersen_US
dc.titleEffect of O2 adsorption on electron scattering at Cu(001) surfacesen_HK
dc.typeArticleen_HK
dc.identifier.emailZahid, F: fzahid@hku.hken_HK
dc.identifier.authorityZahid, F=rp01472en_HK
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1063/1.3489357en_HK
dc.identifier.scopuseid_2-s2.0-77957666968en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-77957666968&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume97en_HK
dc.identifier.issue13en_HK
dc.identifier.isiWOS:000282443800038-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridChawla, JS=18036762900en_HK
dc.identifier.scopusauthoridZahid, F=8568996000en_HK
dc.identifier.scopusauthoridGuo, H=16236337600en_HK
dc.identifier.scopusauthoridGall, D=7102060628en_HK

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