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Article: Fabrication of copper nanorods by low-temperature metal organic chemical vapor deposition

TitleFabrication of copper nanorods by low-temperature metal organic chemical vapor deposition
Authors
KeywordsChemical vapour deposition
Copper nanorods
Organic metal decomposition in low temperature
Issue Date2006
PublisherScience China Press. The Journal's web site is located at http://www.springerlink.com/content/1001-6538/
Citation
Chinese Science Bulletin, 2006, v. 51 n. 21, p. 2662-2668 How to Cite?
AbstractCopper nanorods have been synthesized in mesoporous SBA-15 by a low-temperature metal organic chemical vapor deposition (MOCVD) employing copper (II) acetylacetonate, Cu(acac)2, and hydrogen as a precursor and reactant gas, respectively. The hydrogen plays an important role in chemical reduction of organometallic precursor which enhances mass transfer in the interior of the SBA-15 porous substrate. Such copper nanostructures are of great potentials in the semiconductor due to their unusual optical, magnetic and electronic properties. In addition, it has been found that chemically modifying the substrate surface by carbon deposition is crucial to such synthesis of copper nanostructures in the interior of the SBA-15, which is able to change the surface properties of SBA-15 from hydrophilic to hydrophobic to promote the adsorption of organic cupric precursor. It has also been found that the copper nanoparticles deposited on the external surface are almost eliminated and the copper nanorods are more distinct while the product was treated with ammonia. This approach could be achieved under a mild condition: a low temperature (400°C) and vacuum (2 kPa) which is extremely milder than the conventional method. It actually sounds as a foundation which is the first time to synthesize a copper nanorod at a mild condition of a low reaction temperature and pressure. © 2006 Science in China Press.
Persistent Identifierhttp://hdl.handle.net/10722/132384
ISSN
2015 Impact Factor: 1.789
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorZhang, Yen_HK
dc.contributor.authorLam, FLYen_HK
dc.contributor.authorHu, Xen_HK
dc.contributor.authorYan, Zen_HK
dc.date.accessioned2011-03-28T09:23:53Z-
dc.date.available2011-03-28T09:23:53Z-
dc.date.issued2006en_HK
dc.identifier.citationChinese Science Bulletin, 2006, v. 51 n. 21, p. 2662-2668en_HK
dc.identifier.issn1001-6538en_HK
dc.identifier.urihttp://hdl.handle.net/10722/132384-
dc.description.abstractCopper nanorods have been synthesized in mesoporous SBA-15 by a low-temperature metal organic chemical vapor deposition (MOCVD) employing copper (II) acetylacetonate, Cu(acac)2, and hydrogen as a precursor and reactant gas, respectively. The hydrogen plays an important role in chemical reduction of organometallic precursor which enhances mass transfer in the interior of the SBA-15 porous substrate. Such copper nanostructures are of great potentials in the semiconductor due to their unusual optical, magnetic and electronic properties. In addition, it has been found that chemically modifying the substrate surface by carbon deposition is crucial to such synthesis of copper nanostructures in the interior of the SBA-15, which is able to change the surface properties of SBA-15 from hydrophilic to hydrophobic to promote the adsorption of organic cupric precursor. It has also been found that the copper nanoparticles deposited on the external surface are almost eliminated and the copper nanorods are more distinct while the product was treated with ammonia. This approach could be achieved under a mild condition: a low temperature (400°C) and vacuum (2 kPa) which is extremely milder than the conventional method. It actually sounds as a foundation which is the first time to synthesize a copper nanorod at a mild condition of a low reaction temperature and pressure. © 2006 Science in China Press.en_HK
dc.languageengen_US
dc.publisherScience China Press. The Journal's web site is located at http://www.springerlink.com/content/1001-6538/en_HK
dc.relation.ispartofChinese Science Bulletinen_HK
dc.subjectChemical vapour depositionen_HK
dc.subjectCopper nanorodsen_HK
dc.subjectOrganic metal decomposition in low temperatureen_HK
dc.titleFabrication of copper nanorods by low-temperature metal organic chemical vapor depositionen_HK
dc.typeArticleen_HK
dc.identifier.emailLam, FLY:kefrank@hku.hken_HK
dc.identifier.authorityLam, FLY=rp01470en_HK
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1007/s11434-006-2128-7en_HK
dc.identifier.scopuseid_2-s2.0-33751275961en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-33751275961&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume51en_HK
dc.identifier.issue21en_HK
dc.identifier.spage2662en_HK
dc.identifier.epage2668en_HK
dc.identifier.eissn1861-9541-
dc.identifier.isiWOS:000242914600017-
dc.publisher.placeChinaen_HK
dc.identifier.scopusauthoridZhang, Y=13806862100en_HK
dc.identifier.scopusauthoridLam, FLY=7102075931en_HK
dc.identifier.scopusauthoridHu, X=7404709975en_HK
dc.identifier.scopusauthoridYan, Z=7402519855en_HK

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