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postgraduate thesis: Lithography: friendly routing via forbidden pitch avoidance

TitleLithography: friendly routing via forbidden pitch avoidance
Authors
Advisors
Advisor(s):Ng, TS
Issue Date2004
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
Citation
Shi, S. [石世長]. (2004). Lithography : friendly routing via forbidden pitch avoidance. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4457016
DegreeDoctor of Philosophy
SubjectMicrolithography
Integrated circuits - Masks.
Integrated circuits - Design and construction.
Dept/ProgramElectrical and Electronic Engineering

 

DC FieldValueLanguage
dc.contributor.advisorNg, TS-
dc.contributor.authorShi, Shichang.-
dc.contributor.author石世長.-
dc.date.issued2004-
dc.identifier.citationShi, S. [石世長]. (2004). Lithography : friendly routing via forbidden pitch avoidance. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4457016-
dc.languageeng-
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)-
dc.relation.ispartofHKU Theses Online (HKUTO)-
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.source.urihttp://hub.hku.hk/bib/B44570168-
dc.subject.lcshMicrolithography-
dc.subject.lcshIntegrated circuits - Masks.-
dc.subject.lcshIntegrated circuits - Design and construction.-
dc.titleLithography: friendly routing via forbidden pitch avoidance-
dc.typePG_Thesis-
dc.identifier.hkulb4457016-
dc.description.thesisnameDoctor of Philosophy-
dc.description.thesislevelDoctoral-
dc.description.thesisdisciplineElectrical and Electronic Engineering-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.5353/th_b4457016-
dc.date.hkucongregation2005-

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