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Conference Paper: Nickel ion level in scoliotic patients implanted with nitrogen plasma surface modified nickel-titanium superelastic spinal implant

TitleNickel ion level in scoliotic patients implanted with nitrogen plasma surface modified nickel-titanium superelastic spinal implant
Authors
Issue Date2010
PublisherIEEE.
Citation
The 3rd International NanoElectronics Conference (INEC), Hong Kong, 3-8 January 2010. In Proceedings of the 3rd INEC, 2010, p. 1368 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/126500
ISBN

 

Author Affiliations
  1. The University of Hong Kong
  2. City University of Hong Kong
DC FieldValueLanguage
dc.contributor.authorYeung, KWKen_HK
dc.contributor.authorLam, WNen_HK
dc.contributor.authorNatarajan, Den_HK
dc.contributor.authorWu, SLen_HK
dc.contributor.authorTu, Hen_HK
dc.contributor.authorChu, PKen_HK
dc.contributor.authorChung, CYen_HK
dc.contributor.authorLu, WWen_HK
dc.contributor.authorLuk, KDKen_HK
dc.contributor.authorCheung, KMCen_HK
dc.date.accessioned2010-10-31T12:32:19Z-
dc.date.available2010-10-31T12:32:19Z-
dc.date.issued2010en_HK
dc.identifier.citationThe 3rd International NanoElectronics Conference (INEC), Hong Kong, 3-8 January 2010. In Proceedings of the 3rd INEC, 2010, p. 1368en_HK
dc.identifier.isbn978-1-4244-3543-2-
dc.identifier.urihttp://hdl.handle.net/10722/126500-
dc.languageengen_HK
dc.publisherIEEE.-
dc.relation.ispartofProceedings of the IEEE International NanoElectronics Conference, INEC 2010en_HK
dc.rightsProceedings of the IEEE International NanoElectronics Conference. Copyright © IEEE.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rights©2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.-
dc.titleNickel ion level in scoliotic patients implanted with nitrogen plasma surface modified nickel-titanium superelastic spinal implanten_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=978-1-4244-3543-2 &volume=&spage=1368&epage=&date=2010&atitle=Nickel+ion+level+in+scoliotic+patients+implanted+with+nitrogen+plasma+surface+modified+nickel-titanium+superelastic+spinal+implant-
dc.identifier.emailYeung, KWK:wkkyeung@hkucc.hku.hken_HK
dc.identifier.emailLu, WW:wwlu@hku.hken_HK
dc.identifier.emailLuk, KDK:hcm21000@hku.hken_HK
dc.identifier.emailCheung, KMC:cheungmc@hku.hken_HK
dc.identifier.authorityYeung, KWK=rp00309en_HK
dc.identifier.authorityLu, WW=rp00411en_HK
dc.identifier.authorityLuk, KDK=rp00333en_HK
dc.identifier.authorityCheung, KMC=rp00387en_HK
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1109/INEC.2010.5424850en_HK
dc.identifier.scopuseid_2-s2.0-77951664042en_HK
dc.identifier.hkuros173575en_HK
dc.identifier.spage1368en_HK
dc.identifier.epage1368en_HK
dc.description.otherThe 3rd International NanoElectronics Conference (INEC), Hong Kong, 3-8 January 2010. In Proceedings of the 3rd INEC, 2010, p. 1368-
dc.identifier.scopusauthoridYeung, KWK=13309584700en_HK
dc.identifier.scopusauthoridLam, WN=35995429000en_HK
dc.identifier.scopusauthoridNatarajan, D=35334874800en_HK
dc.identifier.scopusauthoridWu, SL=15125218800en_HK
dc.identifier.scopusauthoridTu, H=35996096100en_HK
dc.identifier.scopusauthoridChu, PK=36040705700en_HK
dc.identifier.scopusauthoridChung, CY=8100842800en_HK
dc.identifier.scopusauthoridLu, WW=7404215221en_HK
dc.identifier.scopusauthoridLuk, KDK=7201921573en_HK
dc.identifier.scopusauthoridCheung, KMC=7402406754en_HK

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