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Conference Paper: An ultraviolet micro-LED array and its application for microlens fabrication

TitleAn ultraviolet micro-LED array and its application for microlens fabrication
Authors
KeywordsLEDs
Nanolithography
Spatial pattern formation
Issue Date2010
PublisherWiley - VCH Verlag GmbH & Co KGaA. The Journal's web site is located at http://www3.interscience.wiley.com/cgi-bin/jhome/102519628
Citation
The 8th International Conference on Nitride Semiconductor (ICNS-8), Jeju Island, Korea, 18-23 October 2009. In Physica Status Solidi (C), 2010, v. 7 n. 7-8, p. 2174-2176 How to Cite?
AbstractWe report on a direct-write lithographic technique for the fabrication of micro-lens arrays with an ultraviolet (UV) micro-light-emitting diode (LED) array, serving as an exposure source. Owing to the Lambertian emission distribution of LEDs, the exposed UV sensitive coating (UV epoxy) adopts the same profile, resulting in spherical lenses being formed naturally, without further reflow. This technique is distinctive from conventional UV curing method and possesses many advantages, including simplicity of processing, allows control of the dimensions of micro-lenses through process parameters, and is readily scalable. Micro-lens arrays of high optical quality have been fabricated by this method. The properties of the lenses are evaluated by optical microscopy and atomic force microscope. The determined focal length is close to the predicted value. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA.
DescriptionPhysica Status Solidi (C), v. 7 n. 7-8 entitled: Special Issue: 8th International Conference on Nitride Semiconductors (ICNS-8)
Persistent Identifierhttp://hdl.handle.net/10722/124727
ISSN
2015 SCImago Journal Rankings: 0.392
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorZhu, Len_HK
dc.contributor.authorLai, PTen_HK
dc.contributor.authorChoi, HWen_HK
dc.date.accessioned2010-10-31T10:50:42Z-
dc.date.available2010-10-31T10:50:42Z-
dc.date.issued2010en_HK
dc.identifier.citationThe 8th International Conference on Nitride Semiconductor (ICNS-8), Jeju Island, Korea, 18-23 October 2009. In Physica Status Solidi (C), 2010, v. 7 n. 7-8, p. 2174-2176en_HK
dc.identifier.issn1862-6351en_HK
dc.identifier.urihttp://hdl.handle.net/10722/124727-
dc.descriptionPhysica Status Solidi (C), v. 7 n. 7-8 entitled: Special Issue: 8th International Conference on Nitride Semiconductors (ICNS-8)-
dc.description.abstractWe report on a direct-write lithographic technique for the fabrication of micro-lens arrays with an ultraviolet (UV) micro-light-emitting diode (LED) array, serving as an exposure source. Owing to the Lambertian emission distribution of LEDs, the exposed UV sensitive coating (UV epoxy) adopts the same profile, resulting in spherical lenses being formed naturally, without further reflow. This technique is distinctive from conventional UV curing method and possesses many advantages, including simplicity of processing, allows control of the dimensions of micro-lenses through process parameters, and is readily scalable. Micro-lens arrays of high optical quality have been fabricated by this method. The properties of the lenses are evaluated by optical microscopy and atomic force microscope. The determined focal length is close to the predicted value. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA.en_HK
dc.languageengen_HK
dc.publisherWiley - VCH Verlag GmbH & Co KGaA. The Journal's web site is located at http://www3.interscience.wiley.com/cgi-bin/jhome/102519628en_HK
dc.relation.ispartofPhysica Status Solidi (C): Current Topics in Solid State Physicsen_HK
dc.subjectLEDsen_HK
dc.subjectNanolithographyen_HK
dc.subjectSpatial pattern formationen_HK
dc.titleAn ultraviolet micro-LED array and its application for microlens fabricationen_HK
dc.typeConference_Paperen_HK
dc.identifier.openurlhttp://library.hku.hk:4550/resserv?sid=HKU:IR&issn=1862-6351&volume=7&issue=7-8&spage=2174&epage=2176&date=2010&atitle=An+ultraviolet+micro-LED+array+and+its+application+for+microlens+fabrication-
dc.identifier.emailLai, PT: laip@eee.hku.hken_HK
dc.identifier.emailChoi, HW:hwchoi@eee.hku.hken_HK
dc.identifier.authorityLai, PT=rp00130en_HK
dc.identifier.authorityChoi, HW=rp00108en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1002/pssc.200983528en_HK
dc.identifier.scopuseid_2-s2.0-77955794355en_HK
dc.identifier.hkuros175223en_HK
dc.identifier.hkuros175257-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-77955794355&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume7en_HK
dc.identifier.issue7-8en_HK
dc.identifier.spage2174en_HK
dc.identifier.epage2176en_HK
dc.identifier.isiWOS:000301587600131-
dc.publisher.placeGermanyen_HK
dc.identifier.scopusauthoridZhu, L=36351290800en_HK
dc.identifier.scopusauthoridLai, PT=7202946460en_HK
dc.identifier.scopusauthoridChoi, HW=7404334877en_HK
dc.customcontrol.immutablesml 160105 - merged-

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