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Book Chapter: Indium Tin Oxide (ITO) thin films: Fabrication, properties, post-deposition treatments and applications

TitleIndium Tin Oxide (ITO) thin films: Fabrication, properties, post-deposition treatments and applications
Authors
Wang, RDjurisic, ABeling, CDFung, SHY
Issue Date2005
PublisherNova Science Publishers, Inc..
Citation
Indium Tin Oxide (ITO) thin films: Fabrication, properties, post-deposition treatments and applications. In Trends in Semiconductor Research, Chapter 6, p. 137-174. Nova Science Publishers, Inc., 2005 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/119800

 

DC FieldValueLanguage
dc.contributor.authorWang, Ren_HK
dc.contributor.authorDjurisic, Aen_HK
dc.contributor.authorBeling, CDen_HK
dc.contributor.authorFung, SHYen_HK
dc.date.accessioned2010-09-26T09:09:53Z-
dc.date.available2010-09-26T09:09:53Z-
dc.date.issued2005en_HK
dc.identifier.citationIndium Tin Oxide (ITO) thin films: Fabrication, properties, post-deposition treatments and applications. In Trends in Semiconductor Research, Chapter 6, p. 137-174. Nova Science Publishers, Inc., 2005en_HK
dc.identifier.urihttp://hdl.handle.net/10722/119800-
dc.languageengen_HK
dc.publisherNova Science Publishers, Inc..en_HK
dc.relation.ispartofTrends in Semiconductor Researchen_HK
dc.titleIndium Tin Oxide (ITO) thin films: Fabrication, properties, post-deposition treatments and applicationsen_HK
dc.typeBook_Chapteren_HK
dc.identifier.emailDjurisic, A: dalek@hkusua.hku.hken_HK
dc.identifier.emailBeling, CD: cdbeling@hkucc.hku.hken_HK
dc.identifier.emailFung, SHY: sfung@hkucc.hku.hken_HK
dc.identifier.authorityDjurisic, A=rp00690en_HK
dc.identifier.authorityBeling, CD=rp00660en_HK
dc.identifier.authorityFung, SHY=rp00695en_HK
dc.identifier.hkuros113200en_HK
dc.identifier.spage137en_HK
dc.identifier.epage174en_HK

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