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Conference Paper: Sensitivity of LR 115 SSNTD in a diffusion chamber

TitleSensitivity of LR 115 SSNTD in a diffusion chamber
Authors
Issue Date2005
PublisherMcMaster University.
Persistent Identifierhttp://hdl.handle.net/10722/109729

 

DC FieldValueLanguage
dc.contributor.authorLeung, SYYen_HK
dc.contributor.authorNikezic, Den_HK
dc.contributor.authorLeung, JKCen_HK
dc.contributor.authorYu, KNen_HK
dc.date.accessioned2010-09-26T01:34:44Z-
dc.date.available2010-09-26T01:34:44Z-
dc.date.issued2005en_HK
dc.identifier.urihttp://hdl.handle.net/10722/109729-
dc.languageengen_HK
dc.publisherMcMaster University.en_HK
dc.relation.ispartof6th International Topical Meeting on Industrial Radiation and Radioisotope Measurement Applicationsen_HK
dc.titleSensitivity of LR 115 SSNTD in a diffusion chamberen_HK
dc.typeConference_Paperen_HK
dc.identifier.emailLeung, JKC: jkcleung@hku.hken_HK
dc.identifier.authorityLeung, JKC=rp00732en_HK
dc.identifier.hkuros112555en_HK

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