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Title | Author(s) | Issue Date | |
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Machine learning for inverse lithography: Using stochastic gradient descent for robust photomask synthesis Journal:Journal of Optics A: Pure and Applied Optics | 2010 |
Title | Author(s) | Issue Date | |
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Machine learning for inverse lithography: Using stochastic gradient descent for robust photomask synthesis Journal:Journal of Optics A: Pure and Applied Optics | 2010 |