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Conference Paper: Computational Imaging Technology for Nanolithography
Title | Computational Imaging Technology for Nanolithography |
---|---|
Authors | |
Issue Date | 2013 |
Publisher | The Japan Society of Applied Physics (JSAP). |
Citation | The Japan Society of Applied Physics (JSAP) - Optical Society of America (OSA) Joint Symposia at the 74th Japan Society of Applied Physics (JSAP) Autumn Meeting, Kyoto, Japan, 16-20 September 2013, p. 128, abstract no. 17p-D5-10 How to Cite? |
Abstract | The rapid advancement of modern electronic technology
is founded on Moore’s Law, which stipulates an exponential
increase in transistor densities, leading to more and
more functionalities in an integrated circuit (IC). A critical
challenge in IC manufacturing lies in the nanolithography
process, where the circuit pattern on a wafer is imprinted
through imaging a photomask. Because of the small feature
size compared with the wavelength of the light source, image
distortion is significant due to diffraction and other
aberrations. Computational technology, together with the
modeling of the imaging process, is now an essential process
to design the source and mask patterns that can counteract
the distortions and allow for the printing of small
features. |
Description | Session: Information Photonics |
Persistent Identifier | http://hdl.handle.net/10722/201234 |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lam, EYM | en_US |
dc.date.accessioned | 2014-08-21T07:18:19Z | - |
dc.date.available | 2014-08-21T07:18:19Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.citation | The Japan Society of Applied Physics (JSAP) - Optical Society of America (OSA) Joint Symposia at the 74th Japan Society of Applied Physics (JSAP) Autumn Meeting, Kyoto, Japan, 16-20 September 2013, p. 128, abstract no. 17p-D5-10 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/201234 | - |
dc.description | Session: Information Photonics | - |
dc.description.abstract | The rapid advancement of modern electronic technology is founded on Moore’s Law, which stipulates an exponential increase in transistor densities, leading to more and more functionalities in an integrated circuit (IC). A critical challenge in IC manufacturing lies in the nanolithography process, where the circuit pattern on a wafer is imprinted through imaging a photomask. Because of the small feature size compared with the wavelength of the light source, image distortion is significant due to diffraction and other aberrations. Computational technology, together with the modeling of the imaging process, is now an essential process to design the source and mask patterns that can counteract the distortions and allow for the printing of small features. | - |
dc.language | eng | en_US |
dc.publisher | The Japan Society of Applied Physics (JSAP). | - |
dc.relation.ispartof | Japan Society of Applied Physics (JSAP) - Optical Society of America (OSA) Joint Symposia | en_US |
dc.title | Computational Imaging Technology for Nanolithography | en_US |
dc.type | Conference_Paper | en_US |
dc.identifier.email | Lam, EYM: elam@eee.hku.hk | en_US |
dc.identifier.authority | Lam, EYM=rp00131 | en_US |
dc.identifier.hkuros | 233724 | en_US |
dc.identifier.spage | 128, abstract no. 17p-D5-10 | - |
dc.identifier.epage | 128, abstract no. 17p-D5-10 | - |
dc.publisher.place | Japan | - |