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Article: Maskless plasmonic lithography at 22 nm resolution

TitleMaskless plasmonic lithography at 22 nm resolution
Authors
Issue Date2011
Citation
Scientific Reports, 2011, v. 1 How to Cite?
AbstractOptical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing.
Persistent Identifierhttp://hdl.handle.net/10722/257096
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorPan, Liang-
dc.contributor.authorPark, Yongshik-
dc.contributor.authorXiong, Yi-
dc.contributor.authorUlin-Avila, Erick-
dc.contributor.authorWang, Yuan-
dc.contributor.authorZeng, Li-
dc.contributor.authorXiong, Shaomin-
dc.contributor.authorRho, Junsuk-
dc.contributor.authorSun, Cheng-
dc.contributor.authorBogy, David B.-
dc.contributor.authorZhang, Xiang-
dc.date.accessioned2018-07-24T08:58:49Z-
dc.date.available2018-07-24T08:58:49Z-
dc.date.issued2011-
dc.identifier.citationScientific Reports, 2011, v. 1-
dc.identifier.urihttp://hdl.handle.net/10722/257096-
dc.description.abstractOptical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing.-
dc.languageeng-
dc.relation.ispartofScientific Reports-
dc.titleMaskless plasmonic lithography at 22 nm resolution-
dc.typeArticle-
dc.description.natureLink_to_subscribed_fulltext-
dc.identifier.doi10.1038/srep00175-
dc.identifier.scopuseid_2-s2.0-84859772329-
dc.identifier.volume1-
dc.identifier.spagenull-
dc.identifier.epagenull-
dc.identifier.eissn2045-2322-
dc.identifier.isiWOS:000300561100002-

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