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Article: Macroscale Transformation Optics Enabled by Photoelectrochemical Etching

TitleMacroscale Transformation Optics Enabled by Photoelectrochemical Etching
Authors
Keywordstransformation optics, photochemical etching
porous silicon
gradient index optics
Issue Date2015
Citation
Advanced Materials, 2015, v. 27, n. 40, p. 6131-6136 How to Cite?
Abstract© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Photoelectrochemical etching of silicon can be used to form lateral refractive index gradients for transformation optical devices. This technique allows the fabrication of macroscale devices with large refractive index gradients. Patterned porous layers can also be lifted from the substrate and transferred to other materials, creating more possibilities for novel devices.
Persistent Identifierhttp://hdl.handle.net/10722/256749
ISSN
2015 Impact Factor: 18.96
2015 SCImago Journal Rankings: 9.021

 

DC FieldValueLanguage
dc.contributor.authorBarth, David S.-
dc.contributor.authorGladden, Christopher-
dc.contributor.authorSalandrino, Alessandro-
dc.contributor.authorO'Brien, Kevin-
dc.contributor.authorYe, Ziliang-
dc.contributor.authorMrejen, Michael-
dc.contributor.authorWang, Yuan-
dc.contributor.authorZhang, Xiang-
dc.date.accessioned2018-07-24T08:57:48Z-
dc.date.available2018-07-24T08:57:48Z-
dc.date.issued2015-
dc.identifier.citationAdvanced Materials, 2015, v. 27, n. 40, p. 6131-6136-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10722/256749-
dc.description.abstract© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Photoelectrochemical etching of silicon can be used to form lateral refractive index gradients for transformation optical devices. This technique allows the fabrication of macroscale devices with large refractive index gradients. Patterned porous layers can also be lifted from the substrate and transferred to other materials, creating more possibilities for novel devices.-
dc.languageeng-
dc.relation.ispartofAdvanced Materials-
dc.subjecttransformation optics, photochemical etching-
dc.subjectporous silicon-
dc.subjectgradient index optics-
dc.titleMacroscale Transformation Optics Enabled by Photoelectrochemical Etching-
dc.typeArticle-
dc.description.natureLink_to_subscribed_fulltext-
dc.identifier.doi10.1002/adma.201502322-
dc.identifier.scopuseid_2-s2.0-84945183543-
dc.identifier.volume27-
dc.identifier.issue40-
dc.identifier.spage6131-
dc.identifier.epage6136-
dc.identifier.eissn1521-4095-

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