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Article: Interfacial and electrical properties of InGaAs metal-oxide-semiconductor capacitor with TiON/TaON multilayer composite gate dielectric
| Title | Interfacial and electrical properties of InGaAs metal-oxide-semiconductor capacitor with TiON/TaON multilayer composite gate dielectric |
|---|---|
| Authors | |
| Issue Date | 2015 |
| Publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ |
| Citation | Applied Physics Letters, 2015, v. 106 n. 12, article no. 123504 How to Cite? |
| Persistent Identifier | http://hdl.handle.net/10722/247435 |
| ISSN | 2021 Impact Factor: 3.971 2020 SCImago Journal Rankings: 1.182 |
| ISI Accession Number ID |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Wang, LS | - |
| dc.contributor.author | Xu, JP | - |
| dc.contributor.author | Liu, L | - |
| dc.contributor.author | Lu, HH | - |
| dc.contributor.author | Lai, PT | - |
| dc.contributor.author | Tang, WM | - |
| dc.date.accessioned | 2017-10-18T08:27:12Z | - |
| dc.date.available | 2017-10-18T08:27:12Z | - |
| dc.date.issued | 2015 | - |
| dc.identifier.citation | Applied Physics Letters, 2015, v. 106 n. 12, article no. 123504 | - |
| dc.identifier.issn | 0003-6951 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/247435 | - |
| dc.language | eng | - |
| dc.publisher | American Institute of Physics. The Journal's web site is located at http://apl.aip.org/ | - |
| dc.relation.ispartof | Applied Physics Letters | - |
| dc.rights | Copyright 2015 AIP Publishing LLC. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Applied Physics Letters, 2015, v. 106 n. 12, article no. 123504 and may be found at https://doi.org/10.1063/1.4916539 | - |
| dc.title | Interfacial and electrical properties of InGaAs metal-oxide-semiconductor capacitor with TiON/TaON multilayer composite gate dielectric | - |
| dc.type | Article | - |
| dc.identifier.email | Lai, PT: laip@eee.hku.hk | - |
| dc.identifier.authority | Lai, PT=rp00130 | - |
| dc.description.nature | published_or_final_version | - |
| dc.identifier.doi | 10.1063/1.4916539 | - |
| dc.identifier.scopus | eid_2-s2.0-84961288810 | - |
| dc.identifier.hkuros | 280869 | - |
| dc.identifier.volume | 106 | - |
| dc.identifier.issue | 12 | - |
| dc.identifier.spage | article no. 123504 | - |
| dc.identifier.epage | article no. 123504 | - |
| dc.identifier.isi | WOS:000351876700050 | - |
| dc.publisher.place | United States | - |
| dc.identifier.issnl | 0003-6951 | - |