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Article: Sparse nonlinear inverse imaging for shot count reduction in inverse lithography

TitleSparse nonlinear inverse imaging for shot count reduction in inverse lithography
Authors
Issue Date2015
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2015, v. 23 n. 21, p. 26919-26931 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/231914
ISSN
2015 Impact Factor: 3.148
2015 SCImago Journal Rankings: 2.186

 

DC FieldValueLanguage
dc.contributor.authorWU, X-
dc.contributor.authorLiu, S-
dc.contributor.authorLv, W-
dc.contributor.authorLam, EYM-
dc.date.accessioned2016-09-20T05:26:20Z-
dc.date.available2016-09-20T05:26:20Z-
dc.date.issued2015-
dc.identifier.citationOptics Express, 2015, v. 23 n. 21, p. 26919-26931-
dc.identifier.issn1094-4087-
dc.identifier.urihttp://hdl.handle.net/10722/231914-
dc.languageeng-
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org-
dc.relation.ispartofOptics Express-
dc.rightsOptics Express. Copyright © Optical Society of America.-
dc.titleSparse nonlinear inverse imaging for shot count reduction in inverse lithography-
dc.typeArticle-
dc.identifier.emailLam, EYM: elam@eee.hku.hk-
dc.identifier.authorityLam, EYM=rp00131-
dc.identifier.doi10.1364/OE.23.026919-
dc.identifier.hkuros264164-
dc.identifier.volume23-
dc.identifier.issue21-
dc.identifier.spage26919-
dc.identifier.epage26931-
dc.publisher.placeUnited States-

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