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Article: Sparse nonlinear inverse imaging for shot count reduction in inverse lithography

TitleSparse nonlinear inverse imaging for shot count reduction in inverse lithography
Authors
WU, XLiu, SLv, WLam, EYM
Issue Date2015
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2015, v. 23 n. 21, p. 26919-26931 How to Cite?
DOI: http://dx.doi.org/10.1364/OE.23.026919
Persistent Identifierhttp://hdl.handle.net/10722/231914
ISSN
1094-4087
2021 Impact Factor: 3.833
2020 SCImago Journal Rankings: 1.394
ISI Accession Number ID
WOS:000366574400004

 

DC FieldValueLanguage
dc.contributor.authorWU, X-
dc.contributor.authorLiu, S-
dc.contributor.authorLv, W-
dc.contributor.authorLam, EYM-
dc.date.accessioned2016-09-20T05:26:20Z-
dc.date.available2016-09-20T05:26:20Z-
dc.date.issued2015-
dc.identifier.citationOptics Express, 2015, v. 23 n. 21, p. 26919-26931-
dc.identifier.issn1094-4087-
dc.identifier.urihttp://hdl.handle.net/10722/231914-
dc.languageeng-
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org-
dc.relation.ispartofOptics Express-
dc.rightsOptics Express. Copyright © Optical Society of America.-
dc.titleSparse nonlinear inverse imaging for shot count reduction in inverse lithography-
dc.typeArticle-
dc.identifier.emailLam, EYM: elam@eee.hku.hk-
dc.identifier.authorityLam, EYM=rp00131-
dc.identifier.doi10.1364/OE.23.026919-
dc.identifier.scopuseid_2-s2.0-84957057339-
dc.identifier.hkuros264164-
dc.identifier.volume23-
dc.identifier.issue21-
dc.identifier.spage26919-
dc.identifier.epage26931-
dc.identifier.isiWOS:000366574400004-
dc.publisher.placeUnited States-
dc.identifier.issnl1094-4087-

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