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Article: Ferroelectricity and tunneling electroresistance effect in asymmetric ferroelectric tunnel junctions

TitleFerroelectricity and tunneling electroresistance effect in asymmetric ferroelectric tunnel junctions
Authors
Issue Date2016
PublisherAIP Publishing. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp
Citation
Journal of Applied Physics, 2016, v. 119 n. 22, p. 224104:1-7 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/227410

 

DC FieldValueLanguage
dc.contributor.authorTao, L-
dc.contributor.authorWang, J-
dc.date.accessioned2016-07-18T09:10:19Z-
dc.date.available2016-07-18T09:10:19Z-
dc.date.issued2016-
dc.identifier.citationJournal of Applied Physics, 2016, v. 119 n. 22, p. 224104:1-7-
dc.identifier.urihttp://hdl.handle.net/10722/227410-
dc.languageeng-
dc.publisherAIP Publishing. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp-
dc.relation.ispartofJournal of Applied Physics-
dc.titleFerroelectricity and tunneling electroresistance effect in asymmetric ferroelectric tunnel junctions-
dc.typeArticle-
dc.identifier.emailTao, L: lltao@hku.hk-
dc.identifier.emailWang, J: jianwang@hku.hk-
dc.identifier.authorityWang, J=rp00799-
dc.identifier.doi10.1063/1.4953642-
dc.identifier.hkuros259132-
dc.identifier.volume119-
dc.identifier.issue22-
dc.identifier.spage224104:1-
dc.identifier.epage7-

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