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Article: Charge-Trapping Characteristics of Fluorinated Thin ZrO2 Film for Nonvolatile Memory Applications

TitleCharge-Trapping Characteristics of Fluorinated Thin ZrO2 Film for Nonvolatile Memory Applications
Authors
Issue Date2014
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 2014, v. 104, article no. 162905 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/219122

 

DC FieldValueLanguage
dc.contributor.authorHuang, XD-
dc.contributor.authorShi, RP-
dc.contributor.authorLai, PT-
dc.date.accessioned2015-09-18T07:13:44Z-
dc.date.available2015-09-18T07:13:44Z-
dc.date.issued2014-
dc.identifier.citationApplied Physics Letters, 2014, v. 104, article no. 162905-
dc.identifier.urihttp://hdl.handle.net/10722/219122-
dc.languageeng-
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/-
dc.relation.ispartofApplied Physics Letters-
dc.rightsApplied Physics Letters. Copyright © American Institute of Physics.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rightsCopyright (2015) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (Applied Physics Letters, 2014, v. 104, article no. 162905) and may be found at (http://dx.doi.org/10.1063/1.4873388).-
dc.titleCharge-Trapping Characteristics of Fluorinated Thin ZrO2 Film for Nonvolatile Memory Applications-
dc.typeArticle-
dc.identifier.emailLai, PT: laip@eee.hku.hk-
dc.identifier.authorityLai, PT=rp00130-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1063/1.4873388-
dc.identifier.hkuros253920-
dc.identifier.volume104-
dc.identifier.spagearticle no. 162905-
dc.identifier.epagearticle no. 162905-

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