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Article: Charge-Trapping Characteristics of BaTiO3 with and without Nitridation for Nonvolatile Memory Applications

TitleCharge-Trapping Characteristics of BaTiO3 with and without Nitridation for Nonvolatile Memory Applications
Authors
Issue Date2014
PublisherPergamon. The Journal's web site is located at http://www.elsevier.com/locate/microrel
Citation
Microelectronics Reliability, 2014, v. 54 n. 11, p. 2388-2391 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/217021
ISSN
2015 Impact Factor: 1.202
2015 SCImago Journal Rankings: 0.675

 

DC FieldValueLanguage
dc.contributor.authorHuang, XD-
dc.contributor.authorShi, RP-
dc.contributor.authorLeung, CH-
dc.contributor.authorLai, PT-
dc.date.accessioned2015-09-18T05:46:13Z-
dc.date.available2015-09-18T05:46:13Z-
dc.date.issued2014-
dc.identifier.citationMicroelectronics Reliability, 2014, v. 54 n. 11, p. 2388-2391-
dc.identifier.issn0026-2714-
dc.identifier.urihttp://hdl.handle.net/10722/217021-
dc.languageeng-
dc.publisherPergamon. The Journal's web site is located at http://www.elsevier.com/locate/microrel-
dc.relation.ispartofMicroelectronics Reliability-
dc.rights© 2014. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.titleCharge-Trapping Characteristics of BaTiO3 with and without Nitridation for Nonvolatile Memory Applications-
dc.typeArticle-
dc.identifier.emailLeung, CH: hreelch@HKUCC.hku.hk-
dc.identifier.emailLai, PT: laip@eee.hku.hk-
dc.identifier.authorityLeung, CH=rp00146-
dc.identifier.authorityLai, PT=rp00130-
dc.description.naturepostprint-
dc.identifier.doi10.1016/j.microrel.2014.05.002-
dc.identifier.hkuros253923-
dc.identifier.volume54-
dc.identifier.issue11-
dc.identifier.spage2388-
dc.identifier.epage2391-
dc.publisher.placeUnited Kingdom-

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