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Article: The Partition Behavior of Perfluorooctanesulfonate (PFOS) and Perfluorooctanesulfonamide (FOSA) on Microplastics

TitleThe Partition Behavior of Perfluorooctanesulfonate (PFOS) and Perfluorooctanesulfonamide (FOSA) on Microplastics
Authors
Wang, FShih, KLi, XY
KeywordsElectrostatic interaction
FOSA
Partition
PFOS
Sorption
Issue Date2015
Citation
Chemosphere, 2015, v. 119, p. 841-847 How to Cite?
DOI: http://dx.doi.org/10.1016/j.chemosphere.2014.08.047
Persistent Identifierhttp://hdl.handle.net/10722/215248
ISI Accession Number ID
WOS:000347739600114

 

DC FieldValueLanguage
dc.contributor.authorWang, F-
dc.contributor.authorShih, K-
dc.contributor.authorLi, XY-
dc.date.accessioned2015-08-21T13:19:06Z-
dc.date.available2015-08-21T13:19:06Z-
dc.date.issued2015-
dc.identifier.citationChemosphere, 2015, v. 119, p. 841-847-
dc.identifier.urihttp://hdl.handle.net/10722/215248-
dc.languageeng-
dc.relation.ispartofChemosphere-
dc.subjectElectrostatic interaction-
dc.subjectFOSA-
dc.subjectPartition-
dc.subjectPFOS-
dc.subjectSorption-
dc.titleThe Partition Behavior of Perfluorooctanesulfonate (PFOS) and Perfluorooctanesulfonamide (FOSA) on Microplastics-
dc.typeArticle-
dc.identifier.emailWang, F: wf777@hku.hk-
dc.identifier.emailShih, K: kshih@hku.hk-
dc.identifier.emailLi, XY: xlia@hkucc.hku.hk-
dc.identifier.authorityShih, K=rp00167-
dc.identifier.authorityLi, XY=rp00222-
dc.identifier.doi10.1016/j.chemosphere.2014.08.047-
dc.identifier.scopuseid_2-s2.0-84919711088-
dc.identifier.hkuros250082-
dc.identifier.volume119-
dc.identifier.spage841-
dc.identifier.epage847-
dc.identifier.isiWOS:000347739600114-

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