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Conference Paper: Efficient source and mask optimization with augmented Lagrangian methods in optical lithography

TitleEfficient source and mask optimization with augmented Lagrangian methods in optical lithography
Authors
Li, JLiu, SLam, EY
Issue Date2013
Citation
The 11th Fraunhofer IISB Lithography Simulation Workshop, Hersbruck, Germany, 26-28 September 2013. How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/201233

 

DC FieldValueLanguage
dc.contributor.authorLi, Jen_US
dc.contributor.authorLiu, Sen_US
dc.contributor.authorLam, EYen_US
dc.date.accessioned2014-08-21T07:18:19Z-
dc.date.available2014-08-21T07:18:19Z-
dc.date.issued2013en_US
dc.identifier.citationThe 11th Fraunhofer IISB Lithography Simulation Workshop, Hersbruck, Germany, 26-28 September 2013.en_US
dc.identifier.urihttp://hdl.handle.net/10722/201233-
dc.languageengen_US
dc.relation.ispartof11th Fraunhofer IISB Lithography Simulation Workshop 2013en_US
dc.titleEfficient source and mask optimization with augmented Lagrangian methods in optical lithographyen_US
dc.typeConference_Paperen_US
dc.identifier.emailLam, EY: elam@eee.hku.hken_US
dc.identifier.authorityLam, EY=rp00131en_US
dc.identifier.hkuros233723en_US

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