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Article: Direct tunneling through high-κ amorphous HfO2: Effects of chemical modification

TitleDirect tunneling through high-κ amorphous HfO2: Effects of chemical modification
Authors
Issue Date2014
Citation
Journal of Applied Physics, 2014, v. 116, p. 023703 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/199201
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorWang, Yen_US
dc.contributor.authorYU, Zen_US
dc.contributor.authorZahid, Fen_US
dc.contributor.authorLiu, Len_US
dc.contributor.authorZhu, Yen_US
dc.contributor.authorWang, Jen_US
dc.contributor.authorGuo, Hen_US
dc.date.accessioned2014-07-22T01:07:43Z-
dc.date.available2014-07-22T01:07:43Z-
dc.date.issued2014en_US
dc.identifier.citationJournal of Applied Physics, 2014, v. 116, p. 023703en_US
dc.identifier.urihttp://hdl.handle.net/10722/199201-
dc.languageengen_US
dc.relation.ispartofJournal of Applied Physicsen_US
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.rightsCopyright (2014) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in (citation of published article) and may be found at (http://dx.doi.org/10.1063/1.4890010).-
dc.titleDirect tunneling through high-κ amorphous HfO2: Effects of chemical modificationen_US
dc.typeArticleen_US
dc.identifier.emailWang, Y: yinwang@hku.hken_US
dc.identifier.emailZahid, F: fzahid@hku.hken_US
dc.identifier.emailWang, J: jianwang@hku.hken_US
dc.identifier.emailGuo, H: guohku@hku.hken_US
dc.identifier.authorityWang, Y=rp01851en_US
dc.identifier.authorityZahid, F=rp01472en_US
dc.identifier.authorityWang, J=rp00799en_US
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1063/1.4890010en_US
dc.identifier.hkuros231012en_US
dc.identifier.volume116en_US
dc.identifier.spage023703en_US
dc.identifier.epage023703en_US
dc.identifier.isiWOS:000340267600032-

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