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Conference Paper: Improved performance of Hf-doped BaTiO3 as charge-traping layer for flash memory applications

TitleImproved performance of Hf-doped BaTiO3 as charge-traping layer for flash memory applications
Authors
KeywordsFlash memory
Charge-trapping layer
Hf-doped BaTi03
Issue Date2013
PublisherIEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/conhome.jsp?punumber=1000853
Citation
The 2013 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC), Hong Kong, 3-5 June 2013. In Conference Proceedings, 2013, p. 1-2 How to Cite?
AbstractBaTi03 with and without Hf incorporation was studied as charge-trapping layer (CTL) for flash memory applications. Comparing with the device with BaTi03 CTL, the one with Hf-doped BaTi03 shows better performance in terms of higher program speed and better data retention due to suppressed leakage by Hf incorporated in BaTi03• Therefore, the Hf-doped BaTi03 is a promising candidate as CTL for flash memory application.
Persistent Identifierhttp://hdl.handle.net/10722/191663
ISBN

 

DC FieldValueLanguage
dc.contributor.authorHuang, Xen_US
dc.contributor.authorLai, PTen_US
dc.date.accessioned2013-10-15T07:14:58Z-
dc.date.available2013-10-15T07:14:58Z-
dc.date.issued2013en_US
dc.identifier.citationThe 2013 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC), Hong Kong, 3-5 June 2013. In Conference Proceedings, 2013, p. 1-2en_US
dc.identifier.isbn978-1-4673-2523-3-
dc.identifier.urihttp://hdl.handle.net/10722/191663-
dc.description.abstractBaTi03 with and without Hf incorporation was studied as charge-trapping layer (CTL) for flash memory applications. Comparing with the device with BaTi03 CTL, the one with Hf-doped BaTi03 shows better performance in terms of higher program speed and better data retention due to suppressed leakage by Hf incorporated in BaTi03• Therefore, the Hf-doped BaTi03 is a promising candidate as CTL for flash memory application.-
dc.languageengen_US
dc.publisherIEEE. The Journal's web site is located at http://ieeexplore.ieee.org/xpl/conhome.jsp?punumber=1000853-
dc.relation.ispartofIEEE Conference on Electron Devices and Solid-State Circuits Proceedingsen_US
dc.rightsIEEE Conference on Electron Devices and Solid-State Circuits Proceedings. Copyright © IEEE.-
dc.rights©2013 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectFlash memory-
dc.subjectCharge-trapping layer-
dc.subjectHf-doped BaTi03-
dc.titleImproved performance of Hf-doped BaTiO3 as charge-traping layer for flash memory applicationsen_US
dc.typeConference_Paperen_US
dc.identifier.emailLai, PT: laip@eee.hku.hken_US
dc.identifier.authorityLai, PT=rp00130en_US
dc.description.naturepublished_or_final_version-
dc.identifier.hkuros226079en_US
dc.identifier.spage1-
dc.identifier.epage2-
dc.publisher.placeUnited Statesen_US
dc.customcontrol.immutablesml 131108-

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