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Article: Change of chemical composition and hydrogen bonding behavior due to chlorination of crosslinked polyamide membranes

TitleChange of chemical composition and hydrogen bonding behavior due to chlorination of crosslinked polyamide membranes
Authors
KeywordsChlorine
Crosslinking
Hydrogen Bonding
Membranes
Polyamides
Issue Date2008
PublisherJohn Wiley & Sons, Inc. The Journal's web site is located at http://www.interscience.wiley.com/jpages/0021-8995/
Citation
Journal Of Applied Polymer Science, 2008, v. 108 n. 4, p. 2061-2066 How to Cite?
AbstractThe effect of membrane exposure to hypochlorite oxidant on property changes (chemical composition and hydrogen bonding behavior) of four FilmTec® thin film composite crosslinked polyamide membranes has been investigated. Crosslinking densities of the membranes were about 25-35%, with about 3-4 chlorines bound to the repeating unit of the polyamide membranes. This was equivalent to ~ 39% of all nitrogens being chlorinated in the polyamide membranes assuming the amide nitrogen is the dominant reaction site with chlorine. FTIR spectra showed the amide I band (C=O stretching peak at 1663 cm -1) of polyamide membranes shifted to higher wave-numbers and the peak intensity of the amide II band (N-H bending peak at 1541 cm -1) decreased after chlorination. The peak shift and decrease of peak intensity resulted from breakage of hydrogen bonds between C=O and N - H groups within the polymers. The XPS and FTIR analytical analysis showed that there is no difference in the chlorine attack of polyamide membranes of higher or lower crosslinking density, and that the chlorination breaks and weakens hydrogen bonding. © 2008 Wiley Periodicals, Inc.
Persistent Identifierhttp://hdl.handle.net/10722/185379
ISSN
2015 Impact Factor: 1.866
2015 SCImago Journal Rankings: 0.578
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorKwon, YNen_US
dc.contributor.authorTang, CYen_US
dc.contributor.authorLeckie, JOen_US
dc.date.accessioned2013-07-30T07:32:03Z-
dc.date.available2013-07-30T07:32:03Z-
dc.date.issued2008en_US
dc.identifier.citationJournal Of Applied Polymer Science, 2008, v. 108 n. 4, p. 2061-2066en_US
dc.identifier.issn0021-8995en_US
dc.identifier.urihttp://hdl.handle.net/10722/185379-
dc.description.abstractThe effect of membrane exposure to hypochlorite oxidant on property changes (chemical composition and hydrogen bonding behavior) of four FilmTec® thin film composite crosslinked polyamide membranes has been investigated. Crosslinking densities of the membranes were about 25-35%, with about 3-4 chlorines bound to the repeating unit of the polyamide membranes. This was equivalent to ~ 39% of all nitrogens being chlorinated in the polyamide membranes assuming the amide nitrogen is the dominant reaction site with chlorine. FTIR spectra showed the amide I band (C=O stretching peak at 1663 cm -1) of polyamide membranes shifted to higher wave-numbers and the peak intensity of the amide II band (N-H bending peak at 1541 cm -1) decreased after chlorination. The peak shift and decrease of peak intensity resulted from breakage of hydrogen bonds between C=O and N - H groups within the polymers. The XPS and FTIR analytical analysis showed that there is no difference in the chlorine attack of polyamide membranes of higher or lower crosslinking density, and that the chlorination breaks and weakens hydrogen bonding. © 2008 Wiley Periodicals, Inc.en_US
dc.languageengen_US
dc.publisherJohn Wiley & Sons, Inc. The Journal's web site is located at http://www.interscience.wiley.com/jpages/0021-8995/en_US
dc.relation.ispartofJournal of Applied Polymer Scienceen_US
dc.subjectChlorineen_US
dc.subjectCrosslinkingen_US
dc.subjectHydrogen Bondingen_US
dc.subjectMembranesen_US
dc.subjectPolyamidesen_US
dc.titleChange of chemical composition and hydrogen bonding behavior due to chlorination of crosslinked polyamide membranesen_US
dc.typeArticleen_US
dc.identifier.emailTang, CY: tangc@hku.hken_US
dc.identifier.authorityTang, CY=rp01765en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1002/app.25657en_US
dc.identifier.scopuseid_2-s2.0-42949089967en_US
dc.identifier.volume108en_US
dc.identifier.issue4en_US
dc.identifier.spage2061en_US
dc.identifier.epage2066en_US
dc.identifier.isiWOS:000254672800001-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridKwon, YN=14123466400en_US
dc.identifier.scopusauthoridTang, CY=35489259800en_US
dc.identifier.scopusauthoridLeckie, JO=7006717360en_US

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