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Article: Deposition behaviour of222Rn progeny on surfaces

TitleDeposition behaviour of222Rn progeny on surfaces
Authors
KeywordsDeposition
Radon Progeny
Recoil Fraction
Issue Date2000
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/nima
Citation
Nuclear Instruments And Methods In Physics Research, Section A: Accelerators, Spectrometers, Detectors And Associated Equipment, 2000, v. 443 n. 2-3, p. 546-556 How to Cite?
AbstractThere are many publications on the deposition of radon progeny on surfaces, but majority of these works measured the airborne radon progeny concentration and then deduced the deposited progeny concentrations indirectly. In this work, direct depositions of 222Rn progeny loaded aerosols on different wall coatings were monitored by a silicon α-detector rotating over the coatings. The wall coatings were applied on the inner surface of a small stainless-steel chamber that was connected to a much larger radon chamber. The 222Rn concentration, the potential alpha energy concentration, equilibrium factor and unattached fraction of 222Rn progeny, the aerosol concentration and aerosol size distribution inside the radon chamber were all controlled precisely. The air in the radon chamber was used to feed the small chamber where deposition velocities and recoil fractions of the radon progeny were measured. The deposition velocity of unattached progeny was found to range from 3 to 5 m h-1, being higher at increased air motion. The deposition velocity of attached progeny was about 10 times slower at 0.2-0.5 m h-1 and enhanced deposition by air motion was not as significant. Recoil fractions of unattached and attached 214Po were around 0.50-0.57 and 0.45-0.53, respectively. A slight decrease in recoil fraction of unattached 214Pb was observed at higher air motion. © 2000 Elsevier Science B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/174790
ISSN
2015 Impact Factor: 1.2
2015 SCImago Journal Rankings: 0.980
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorLeung, JKCen_US
dc.contributor.authorHo, CWen_US
dc.contributor.authorTso, MYWen_US
dc.date.accessioned2012-11-26T08:47:27Z-
dc.date.available2012-11-26T08:47:27Z-
dc.date.issued2000en_US
dc.identifier.citationNuclear Instruments And Methods In Physics Research, Section A: Accelerators, Spectrometers, Detectors And Associated Equipment, 2000, v. 443 n. 2-3, p. 546-556en_US
dc.identifier.issn0168-9002en_US
dc.identifier.urihttp://hdl.handle.net/10722/174790-
dc.description.abstractThere are many publications on the deposition of radon progeny on surfaces, but majority of these works measured the airborne radon progeny concentration and then deduced the deposited progeny concentrations indirectly. In this work, direct depositions of 222Rn progeny loaded aerosols on different wall coatings were monitored by a silicon α-detector rotating over the coatings. The wall coatings were applied on the inner surface of a small stainless-steel chamber that was connected to a much larger radon chamber. The 222Rn concentration, the potential alpha energy concentration, equilibrium factor and unattached fraction of 222Rn progeny, the aerosol concentration and aerosol size distribution inside the radon chamber were all controlled precisely. The air in the radon chamber was used to feed the small chamber where deposition velocities and recoil fractions of the radon progeny were measured. The deposition velocity of unattached progeny was found to range from 3 to 5 m h-1, being higher at increased air motion. The deposition velocity of attached progeny was about 10 times slower at 0.2-0.5 m h-1 and enhanced deposition by air motion was not as significant. Recoil fractions of unattached and attached 214Po were around 0.50-0.57 and 0.45-0.53, respectively. A slight decrease in recoil fraction of unattached 214Pb was observed at higher air motion. © 2000 Elsevier Science B.V. All rights reserved.en_US
dc.languageengen_US
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/nimaen_US
dc.relation.ispartofNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipmenten_US
dc.subjectDepositionen_US
dc.subjectRadon Progenyen_US
dc.subjectRecoil Fractionen_US
dc.titleDeposition behaviour of222Rn progeny on surfacesen_US
dc.typeArticleen_US
dc.identifier.emailLeung, JKC: jkcleung@hku.hken_US
dc.identifier.authorityLeung, JKC=rp00732en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1016/S0168-9002(99)01153-5en_US
dc.identifier.scopuseid_2-s2.0-0033903723en_US
dc.identifier.hkuros52272-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0033903723&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume443en_US
dc.identifier.issue2-3en_US
dc.identifier.spage546en_US
dc.identifier.epage556en_US
dc.identifier.isiWOS:000086271200032-
dc.publisher.placeNetherlandsen_US
dc.identifier.scopusauthoridLeung, JKC=24080627200en_US
dc.identifier.scopusauthoridHo, CW=12804270500en_US
dc.identifier.scopusauthoridTso, MYW=7102052118en_US

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