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Article: Correlation of spectral emission intensity in the inductively coupled plasma and laser-induced plasma during laser ablation of solid samples

TitleCorrelation of spectral emission intensity in the inductively coupled plasma and laser-induced plasma during laser ablation of solid samples
Authors
Issue Date1995
PublisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/ac
Citation
Analytical Chemistry, 1995, v. 67 n. 14, p. 2444-2450 How to Cite?
AbstractSpectral atomic emission intensity from laser-induced plasmas (LJPs) exhibits excellent correlation with atomic emission intensity in the inductively coupled plasma (ICP) for a wide variety of materials and laser powers. Laser ablation sampling with introduction into an ICP for chemical analysis has, among other factors, a strong nonlinear dependence on laser energy, spot size, and material composition. The LIP emission also has a similar nonlinear dependence and is shown to correspond with the ICP behavior. The correlation is demonstrated for several homogeneous metallic and oxide materials during laser ablation sampling over a range of power densities and incident laser beam spot sizes. The correlation is best for higher melting temperature materials and moderate laser power density. The LIP and ICP emission intensities both show similar dependence for mass ablation rate versus power density and laser beam spot size. A normalized ICP/area over LIP emission ratio shows that a functional relationship can be found for changes in ICP intensity with changes in laser power density. The correlation shows that the ICP intensity accurately reflects changes in the laser ablation process and that the LIP may possibly be used for internal monitoring during laser sampling with the ICP.
Persistent Identifierhttp://hdl.handle.net/10722/167542
ISSN
2015 Impact Factor: 5.886
2015 SCImago Journal Rankings: 2.369
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorFernandez, Aen_US
dc.contributor.authorMao, XLen_US
dc.contributor.authorChan, WTen_US
dc.contributor.authorShannon, MAen_US
dc.contributor.authorRusso, REen_US
dc.date.accessioned2012-10-08T03:08:17Z-
dc.date.available2012-10-08T03:08:17Z-
dc.date.issued1995en_US
dc.identifier.citationAnalytical Chemistry, 1995, v. 67 n. 14, p. 2444-2450en_US
dc.identifier.issn0003-2700en_US
dc.identifier.urihttp://hdl.handle.net/10722/167542-
dc.description.abstractSpectral atomic emission intensity from laser-induced plasmas (LJPs) exhibits excellent correlation with atomic emission intensity in the inductively coupled plasma (ICP) for a wide variety of materials and laser powers. Laser ablation sampling with introduction into an ICP for chemical analysis has, among other factors, a strong nonlinear dependence on laser energy, spot size, and material composition. The LIP emission also has a similar nonlinear dependence and is shown to correspond with the ICP behavior. The correlation is demonstrated for several homogeneous metallic and oxide materials during laser ablation sampling over a range of power densities and incident laser beam spot sizes. The correlation is best for higher melting temperature materials and moderate laser power density. The LIP and ICP emission intensities both show similar dependence for mass ablation rate versus power density and laser beam spot size. A normalized ICP/area over LIP emission ratio shows that a functional relationship can be found for changes in ICP intensity with changes in laser power density. The correlation shows that the ICP intensity accurately reflects changes in the laser ablation process and that the LIP may possibly be used for internal monitoring during laser sampling with the ICP.en_US
dc.languageengen_US
dc.publisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/acen_US
dc.relation.ispartofAnalytical Chemistryen_US
dc.titleCorrelation of spectral emission intensity in the inductively coupled plasma and laser-induced plasma during laser ablation of solid samplesen_US
dc.typeArticleen_US
dc.identifier.emailChan, WT:wtchan@hku.hken_US
dc.identifier.authorityChan, WT=rp00668en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1021/ac00110a020-
dc.identifier.scopuseid_2-s2.0-0029343047en_US
dc.identifier.hkuros13838-
dc.identifier.volume67en_US
dc.identifier.issue14en_US
dc.identifier.spage2444en_US
dc.identifier.epage2450en_US
dc.identifier.isiWOS:A1995RJ07200020-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridFernandez, A=7403495178en_US
dc.identifier.scopusauthoridMao, XL=7402841260en_US
dc.identifier.scopusauthoridChan, WT=7403918827en_US
dc.identifier.scopusauthoridShannon, MA=7202548972en_US
dc.identifier.scopusauthoridRusso, RE=7201443495en_US

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