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Article: Plasma shielding during picosecond laser sampling of solid materials by ablation in He versus Ar atmosphere

TitlePlasma shielding during picosecond laser sampling of solid materials by ablation in He versus Ar atmosphere
Authors
Issue Date1993
PublisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp
Citation
Journal Of Applied Physics, 1993, v. 74 n. 8, p. 4915-4922 How to Cite?
AbstractThe influence of plasma shielding on the coupling of laser energy to a target surface during picosecond pulsed laser-material interactions is demonstrated using a He and Ar gas atmosphere. An inductively coupled plasma-atomic emission spectrometer (ICP-AES) is used to monitor the quantity of copper material removed during picosecond and nanosecond pulsed-laser sampling. The intensity of Cu i emission from the ICP-AES was found to be 16.4 times larger with He as the gas medium compared to Ar during picosecond laser sampling. It was also observed that depth of craters in the copper targets decreased as the gas pressure was increased beyond 10 Torr in Ar and 100 Torr in He. Possible mechanisms of shock waves, multiphoton ionization, and plasma shielding to explain these observations are discussed. For plasma shielding to occur in the picosecond time regime, the existence of high-energy photoelectrons emitted from a Cu sample during the leading edge of laser pulse is postulated. These electrons form a plasma in the gas above the target via an inverse bremsstrahlung process and the plasma absorbs part of laser energy. The electron density versus pressure was calculated from a simple model and found to have similar behavior as the crater-depth data.
Persistent Identifierhttp://hdl.handle.net/10722/167513
ISSN
2015 Impact Factor: 2.101
2015 SCImago Journal Rankings: 0.603
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorMao, XLen_US
dc.contributor.authorChan, WTen_US
dc.contributor.authorShannon, MAen_US
dc.contributor.authorRusso, REen_US
dc.date.accessioned2012-10-08T03:07:53Z-
dc.date.available2012-10-08T03:07:53Z-
dc.date.issued1993en_US
dc.identifier.citationJournal Of Applied Physics, 1993, v. 74 n. 8, p. 4915-4922en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://hdl.handle.net/10722/167513-
dc.description.abstractThe influence of plasma shielding on the coupling of laser energy to a target surface during picosecond pulsed laser-material interactions is demonstrated using a He and Ar gas atmosphere. An inductively coupled plasma-atomic emission spectrometer (ICP-AES) is used to monitor the quantity of copper material removed during picosecond and nanosecond pulsed-laser sampling. The intensity of Cu i emission from the ICP-AES was found to be 16.4 times larger with He as the gas medium compared to Ar during picosecond laser sampling. It was also observed that depth of craters in the copper targets decreased as the gas pressure was increased beyond 10 Torr in Ar and 100 Torr in He. Possible mechanisms of shock waves, multiphoton ionization, and plasma shielding to explain these observations are discussed. For plasma shielding to occur in the picosecond time regime, the existence of high-energy photoelectrons emitted from a Cu sample during the leading edge of laser pulse is postulated. These electrons form a plasma in the gas above the target via an inverse bremsstrahlung process and the plasma absorbs part of laser energy. The electron density versus pressure was calculated from a simple model and found to have similar behavior as the crater-depth data.en_US
dc.languageengen_US
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jspen_US
dc.relation.ispartofJournal of Applied Physicsen_US
dc.titlePlasma shielding during picosecond laser sampling of solid materials by ablation in He versus Ar atmosphereen_US
dc.typeArticleen_US
dc.identifier.emailChan, WT:wtchan@hku.hken_US
dc.identifier.authorityChan, WT=rp00668en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1063/1.354325en_US
dc.identifier.scopuseid_2-s2.0-0027687154en_US
dc.identifier.volume74en_US
dc.identifier.issue8en_US
dc.identifier.spage4915en_US
dc.identifier.epage4922en_US
dc.identifier.isiWOS:A1993MC03000017-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridMao, XL=7402841260en_US
dc.identifier.scopusauthoridChan, WT=7403918827en_US
dc.identifier.scopusauthoridShannon, MA=7202548972en_US
dc.identifier.scopusauthoridRusso, RE=7201443495en_US

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