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Article: The aetiology and treatment of oral halitosis: An update

TitleThe aetiology and treatment of oral halitosis: An update
Authors
Issue Date2004
PublisherHong Kong Medical Association. The Journal's web site is located at http://www.hkmj.org/resources/supp.html
Citation
Hong Kong Medical Journal, 2004, v. 10 n. 6, p. 414-418 How to Cite?
AbstractHalitosis refers to the condition of offensive mouth odour. More than 90% of cases of halitosis originate from the oral cavity. The implicated bacteria (Fusobacterium nucleatum, Prevotella intermedia, and Tannerella forsythensis) are located in stagnant areas in the oral cavity, such as the dorsal surface of tongue, periodontal pockets, and interproximal areas. These bacteria proteolyse the amino acids releasing volatile sulphur compounds. The management of halitosis involves determining and eliminating the causes, which includes identifying any contributory factors, because certain medical conditions are also associated with characteristic smells. Professional advice should be given on oral hygiene and diet, and treatments should include dental scaling, and root planing of the associated periodontal pockets to reduce the bacterial loading. In addition to the normal oral hygiene practice, tongue cleaning and use of mouthwash are advocated. This paper discusses the common aetiological factors, classification of oral halitosis, and its treatment.
Persistent Identifierhttp://hdl.handle.net/10722/154284
ISSN
2015 Impact Factor: 0.887
2015 SCImago Journal Rankings: 0.279
References

 

DC FieldValueLanguage
dc.contributor.authorLee, PPCen_US
dc.contributor.authorMak, WYen_US
dc.contributor.authorNewsome, Pen_US
dc.date.accessioned2012-08-08T08:24:23Z-
dc.date.available2012-08-08T08:24:23Z-
dc.date.issued2004en_US
dc.identifier.citationHong Kong Medical Journal, 2004, v. 10 n. 6, p. 414-418en_US
dc.identifier.issn1024-2708en_US
dc.identifier.urihttp://hdl.handle.net/10722/154284-
dc.description.abstractHalitosis refers to the condition of offensive mouth odour. More than 90% of cases of halitosis originate from the oral cavity. The implicated bacteria (Fusobacterium nucleatum, Prevotella intermedia, and Tannerella forsythensis) are located in stagnant areas in the oral cavity, such as the dorsal surface of tongue, periodontal pockets, and interproximal areas. These bacteria proteolyse the amino acids releasing volatile sulphur compounds. The management of halitosis involves determining and eliminating the causes, which includes identifying any contributory factors, because certain medical conditions are also associated with characteristic smells. Professional advice should be given on oral hygiene and diet, and treatments should include dental scaling, and root planing of the associated periodontal pockets to reduce the bacterial loading. In addition to the normal oral hygiene practice, tongue cleaning and use of mouthwash are advocated. This paper discusses the common aetiological factors, classification of oral halitosis, and its treatment.en_US
dc.languageengen_US
dc.publisherHong Kong Medical Association. The Journal's web site is located at http://www.hkmj.org/resources/supp.htmlen_US
dc.relation.ispartofHong Kong Medical Journalen_US
dc.subject.meshBacteroidaceae Infections - Complicationsen_US
dc.subject.meshDieten_US
dc.subject.meshFusobacterium Infections - Complicationsen_US
dc.subject.meshFusobacterium Nucleatum - Growth & Developmenten_US
dc.subject.meshHalitosis - Etiology - Therapyen_US
dc.subject.meshHumansen_US
dc.subject.meshMouth - Microbiologyen_US
dc.subject.meshOral Healthen_US
dc.subject.meshOral Hygiene - Methodsen_US
dc.subject.meshPeriodontal Diseases - Complicationsen_US
dc.subject.meshPeriodontal Pocket - Complications - Microbiology - Therapyen_US
dc.subject.meshPrevotella Intermedia - Growth & Developmenten_US
dc.titleThe aetiology and treatment of oral halitosis: An updateen_US
dc.typeArticleen_US
dc.identifier.emailNewsome, P:newsome@hkucc.hku.hken_US
dc.identifier.authorityNewsome, P=rp00017en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.pmid15591601-
dc.identifier.scopuseid_2-s2.0-10844273231en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-10844273231&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume10en_US
dc.identifier.issue6en_US
dc.identifier.spage414en_US
dc.identifier.epage418en_US
dc.publisher.placeHong Kongen_US
dc.identifier.scopusauthoridLee, PPC=7406120389en_US
dc.identifier.scopusauthoridMak, WY=7005317282en_US
dc.identifier.scopusauthoridNewsome, P=35830103400en_US

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