| Title | Author(s) | Year | View Count |
 | Computation lithography: Virtual reality and virtual virtuality | Lam, EY; Wong, AKK | 2009 | 280 |
 | The nebulous hotspot and algorithm variability | Wong, AKK; Lam, EY | 2009 | 111 |
| Computation lithography: Virtual reality and virtual virtuality | Wong, AKK; Lam, EY | 2009 | 60 |
| Designing of precomputational-based low-power Viterbi decoder | Yang, JL; Wong, AKK | 2004 | 639 |
 | Standard cell design with regularly placed contacts and gates | Wang, J; Wong, AKK; Lam, EYM | 2004 | 79 |
| Modeling the effects of patterning error on MOSFET | Pun, CH; Lai, PT; Wong, AKK | 2004 | 61 |
| Effects of grid-placed contacts on circuit performance | Wang, J; Wong, AKK | 2003 | 626 |
| Placement sensitivity to aberration in optical imaging | Mak, GYH; Lam, EYM; Wong, AKK | 2003 | 753 |
| Sensitivity of 1D mask features towards aberration in photolithography | Mak, GYH; Wong, AKK; Lam, EYM | 2003 | 86 |
| Standard cell layout with grid-placed contacts | Wang, J; Wong, AKK; Lam, EYM | 2003 | 100 |
| A study on theoretical representation of intermodulation in CMOS balanced mixers | Wang, J; Wong, AKK | 2002 | 2,001 |
| Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment | Pong, WT; Wong, AKK | 2002 | 673 |
| Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks | Wong, AKK | 2002 | 707 |
| Quantification of image quality | Pong, WT; Wong, AKK | 2002 | 928 |
| Optimum mask and source patterns to print a given shape | Rosenbluth, AE; Bukofsky, S; Fonseca, S; Hibbs, M; Lai, K; Molless, A; Singh, RN; Wong, AKK | 2002 | 857 |
| Effects of mismatch on CMOS double-balanced mixers: a theoreticalanalysis | Wang, J; Wong, AKK | 2001 | 1,883 |
| Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations | Wong, AKK; Liebmann, LW; Molless, AF | 2001 | 644 |
| Aberration measurement using in-situ two-beam interferometry | Kirk, JP; Kunkel, G; Wong, AKK | 2001 | 952 |
| Asymmetric biasing for subgrid pattern adjustment | Wong, AKK; Liebmann, LW | 2001 | 554 |
| Tradeoffs in Modified DiscreteCosine Transform implementations | Yang, X; Shi, S; Wong, AKK | 2001 | 531 |
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