Browsing by Author Wong, AKK

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TitleAuthor(s)Issue DateViews
 
2001
72
 
2001
59
 
2001
55
 
2001
188
 
2009
82
2009
45
 
2004
59
 
2003
52
 
2001
59
 
Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment
Proceeding/Conference:IEEE Hong Kong Electron Devices Meeting Proceedings
2002
56
Modeling the effects of patterning error on MOSFET
Proceeding/Conference:International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT
2004
40
The nebulous hotspot and algorithm variability
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2009
54
 
2002
52
 
2001
108
 
Placement sensitivity to aberration in optical imaging
Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits
2003
50
 
Quantification of image quality
Proceeding/Conference:SPIE - International Society for Optical Engineering. Proceedings
2002
88
 
Sensitivity of 1D mask features towards aberration in photolithography
Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
2003
36
 
Standard cell layout with grid-placed contacts
Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
2003
53
 
2002
191
 
2002
56