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TypeTitleAuthor(s)YearViews
Computation lithography: Virtual reality and virtual virtuality
Journal:
Optics Express
Publisher:
Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Lam, EY; Wong, AKK2009362
 
The nebulous hotspot and algorithm variability
Proceedings/Conference:
Proceedings of SPIE - The International Society for Optical Engineering
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
Wong, AKK; Lam, EY2009154
 
Computation lithography: Virtual reality and virtual virtuality
Proceedings/Conference:
ECS Transactions
Wong, AKK; Lam, EY2009107
 
Standard cell design with regularly placed contacts and gates
Proceedings/Conference:
Design and Process Integration for Microelectronic Manufacturing
Wang, J; Wong, AKK; Lam, EYM2004112
 
Designing of precomputational-based low-power Viterbi decoder
Publisher:
IEEE.
Yang, JL; Wong, AKK2004675
 
Modeling the effects of patterning error on MOSFET
Proceedings/Conference:
International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT
Pun, CH; Lai, PT; Wong, AKK2004119
 
Standard cell layout with grid-placed contacts
Proceedings/Conference:
Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
Wang, J; Wong, AKK; Lam, EYM2003115
 
Sensitivity of 1D mask features towards aberration in photolithography
Proceedings/Conference:
Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
Mak, GYH; Wong, AKK; Lam, EYM2003117
 
Placement sensitivity to aberration in optical imaging
Publisher:
IEEE.
Mak, GYH; Lam, EYM; Wong, AKK2003771
 
Effects of grid-placed contacts on circuit performance
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Wang, J; Wong, AKK2003664
 
A study on theoretical representation of intermodulation in CMOS balanced mixers
Publisher:
IEEE.
Wang, J; Wong, AKK20022,059
 
Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment
Publisher:
IEEE.
Pong, WT; Wong, AKK2002737
 
Optimized Alternating Phase Shifted Mask DesignLiebmann, L; Wong, AKK2002783
 
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Wong, AKK2002721
 
Quantification of image quality
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Pong, WT; Wong, AKK20021,015
 
Optimum mask and source patterns to print a given shape
Publisher:
S P I E - International Society for Optical Engineering.
Rosenbluth, AE; Bukofsky, S; Fonseca, S; Hibbs, M; Lai, K; Molless, A; Singh, RN; Wong, AKK2002861
 
Effects of mismatch on CMOS double-balanced mixers: a theoreticalanalysis
Publisher:
IEEE.
Wang, J; Wong, AKK20011,915
 
Detection Of Phase Defects On Photomasks By Differential ImagingFerguson, RA; Wong, AKK2001981
 
Tradeoffs in Modified DiscreteCosine Transform implementations
Publisher:
IEEE.
Yang, X; Shi, S; Wong, AKK2001569
 
Kernel-Based Fast Aerial Image Computation For A Large Scale Design Of Integrated Circuit PatternsWong, AKK; Ferguson, R20011,201
 
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