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TypeTitleAuthor(s)YearViews
Computation lithography: Virtual reality and virtual virtuality
Proceedings/Conference:
ECS Transactions
Wong, AKK; Lam, EY200993
 
The nebulous hotspot and algorithm variability
Proceedings/Conference:
Proceedings of SPIE - The International Society for Optical Engineering
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
Wong, AKK; Lam, EY2009142
 
Computation lithography: Virtual reality and virtual virtuality
Journal:
Optics Express
Publisher:
Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Lam, EY; Wong, AKK2009341
 
Standard cell design with regularly placed contacts and gates
Proceedings/Conference:
Design and Process Integration for Microelectronic Manufacturing
Wang, J; Wong, AKK; Lam, EYM2004100
 
Modeling the effects of patterning error on MOSFET
Proceedings/Conference:
International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT
Pun, CH; Lai, PT; Wong, AKK200498
 
Designing of precomputational-based low-power Viterbi decoder
Publisher:
IEEE.
Yang, JL; Wong, AKK2004664
 
Standard cell layout with grid-placed contacts
Proceedings/Conference:
Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
Wang, J; Wong, AKK; Lam, EYM2003109
 
Sensitivity of 1D mask features towards aberration in photolithography
Proceedings/Conference:
Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference
Mak, GYH; Wong, AKK; Lam, EYM2003108
 
Effects of grid-placed contacts on circuit performance
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Wang, J; Wong, AKK2003645
 
Placement sensitivity to aberration in optical imaging
Publisher:
IEEE.
Mak, GYH; Lam, EYM; Wong, AKK2003757
 
A study on theoretical representation of intermodulation in CMOS balanced mixers
Publisher:
IEEE.
Wang, J; Wong, AKK20022,042
 
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Wong, AKK2002705
 
Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment
Publisher:
IEEE.
Pong, WT; Wong, AKK2002720
 
Optimum mask and source patterns to print a given shape
Publisher:
S P I E - International Society for Optical Engineering.
Rosenbluth, AE; Bukofsky, S; Fonseca, S; Hibbs, M; Lai, K; Molless, A; Singh, RN; Wong, AKK2002844
 
Optimized Alternating Phase Shifted Mask DesignLiebmann, L; Wong, AKK2002765
 
Quantification of image quality
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Pong, WT; Wong, AKK2002999
 
Asymmetric biasing for subgrid pattern adjustment
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Wong, AKK; Liebmann, LW2001569
 
Aberration measurement using in-situ two-beam interferometry
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Kirk, JP; Kunkel, G; Wong, AKK2001973
 
Optimum mask and source patterns to print a given shape
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Rosenbluth, AE; Bukofsky, SJ; Hibbs, MS; Lai, K; Molless, AF; Singh, RN; Wong, AKK2001799
 
Characterization of linewidth variation on 248- and 193-nm exposure tools
Publisher:
S P I E - International Society for Optical Engineering. The Journal's web site is located at http://www.spie.org/app/Publications/index.cfm?fuseaction=proceedings
Gabor, A; Brunner, T; Chen, J; Chen, N; Deshpande, S; Ferguson, R; Horak, DV; Holmes, S; Liebmann, L; Mansfield, S; Molless, A; Progler, CJ; Rabidoux, R; Ryan, D; Talvi, P; Tsou, L; Vampatella, B; Wong, AKK; Yang, Q; Yu, CF2001779
 
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