| Title | Author(s) | Year | View Count |
 | Nebulous hotspot and algorithm variability in computation lithography | Lam, EY; Wong, AK | 2010 | 164 |
| Regularization of inverse photomask synthesis to enhance manufacturability | Jia, N; Wong, AK; Lam, EY | 2009 | 196 |
 | Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography | Chan, SH; Wong, AK; Lam, EY | 2008 | 176 |
| Robust mask design with defocus variation using inverse synthesis | Jia, N; Wong, AK; Lam, EY | 2008 | 54 |
| Optimization of photomask design for reducing aberration-induced placement error | Mak, GY; Wong, AK; Lam, EY | 2006 | 616 |
| ASPD: A prospective study of adequacy in asian patients on long term, small volume, continuous ambulatory peritoneal dialysis | Lam, MF; Tang, C; Wong, AK; Tong, KL; Yu, AW; Li, CS; Cheung, KO; Lai, KN | 2006 | 97 |
| Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates | Wang, J; Wong, AK; Lam, EY | 2005 | 742 |
| A report with consensus statements of the International Society of Nephrology 2004 Consensus Workshop on Prevention of Progression of Renal Disease, Hong Kong, June 29, 2004 | Li, PKT; Weening, JJ; Dirks, J; Lui, SL; Szeto, CC; Tang, S; Atkins, RC; Mitch, WE; Chow, KM; D'Amico, G; Freedman, BI; Harris, DC; Hooi, LS; De Jong, PE; KincaidSmith, P; Lai, KN; Lee, E; Li, FK; Lin, SY; Lo, WK; Mani, MK; Mathew, T; Murakami, M; Qian, JQ; Ramirez, S; Reiser, T; Tomino, Y; Tong, MK; Tsang, WK; Tungsanga, K; Wang, H; Wong, AK; Wong, KM; Yang, WC; De Zeeuw, D; Yu, AW; Memuzzi, G | 2005 | 190 |
| Alternating phase-shifting mask design for low aberration sensitivity | Mak, GY; Wong, AK; Lam, EY | 2005 | 55 |
| Performance optimization for gridded-layout standard cells | Wang, J; Wong, AK; Lam, EY | 2004 | 741 |
| Alternating phase-shifting mask design for low aberration sensitivity | Mak, GY; Wong, AK; Lam, EY | 2004 | 837 |
| Standard cell layout with regular contact placement | Wang, J; Wong, AK; Lam, EY | 2004 | 661 |
| Standard cell design with regularly-placed contacts and gates | Wang, J; Wong, AK; Lam, EY | 2004 | 65 |
| Forbidden area avoidance with spacing technique for layout optimization | Shi, S; Wong, AK; Ng, TS | 2004 | 55 |
| Microlithography: trends, challenges, solutions, and their impact on design | Wong, AK | 2003 | 1,006 |
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