Browsing by Author Wong, AK

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Showing results 1 to 15 of 15
TitleAuthor(s)Issue DateViews
 
Alternating phase-shifting mask design for low aberration sensitivity
Journal:Journal of Microlithography, Microfabrication and Microsystems
2005
139
 
Alternating phase-shifting mask design for low aberration sensitivity
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
895
 
2006
179
Forbidden area avoidance with spacing technique for layout optimization
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
141
 
2008
229
 
2003
1026
 
Nebulous hotspot and algorithm variability in computation lithography
Proceeding/Conference:Journal of Micro/ Nanolithography, MEMS, and MOEMS
2010
215
 
Optimization of photomask design for reducing aberration-induced placement error
Journal:IEEE Transactions on Semiconductor Manufacturing
2006
636
 
Performance optimization for gridded-layout standard cells
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
814
 
Regularization of inverse photomask synthesis to enhance manufacturability
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2009
247
2005
353
Robust mask design with defocus variation using inverse synthesis
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2008
139
Standard cell design with regularly-placed contacts and gates
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
136
 
Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates
Journal:Journal of Microlithography, Microfabrication and Microsystems
2005
816
 
Standard cell layout with regular contact placement
Proceeding/Conference:IEEE Transactions on Semiconductor Manufacturing
2004
717