Browsing by Author Wong, AK

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Showing results 1 to 15 of 15
TitleAuthor(s)Issue DateViews
 
Alternating phase-shifting mask design for low aberration sensitivity
Journal:Journal of Microlithography, Microfabrication and Microsystems
2005
22
 
Alternating phase-shifting mask design for low aberration sensitivity
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
284
 
2006
37
Forbidden area avoidance with spacing technique for layout optimization
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
35
 
2008
82
 
2003
240
 
Nebulous hotspot and algorithm variability in computation lithography
Journal:Journal of Micro/ Nanolithography, MEMS, and MOEMS
2010
82
 
Optimization of photomask design for reducing aberration-induced placement error
Journal:IEEE Transactions on Semiconductor Manufacturing
2006
236
 
Performance optimization for gridded-layout standard cells
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
182
 
Regularization of inverse photomask synthesis to enhance manufacturability
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2009
98
2005
96
Robust mask design with defocus variation using inverse synthesis
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2008
18
Standard cell design with regularly-placed contacts and gates
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
32
 
Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates
Journal:Journal of Microlithography, Microfabrication and Microsystems
2005
116
 
Standard cell layout with regular contact placement
Journal:IEEE Transactions on Semiconductor Manufacturing
2004
155