Results 1 to 15 of 15
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TypeTitleAuthor(s)YearViews
Nebulous hotspot and algorithm variability in computation lithographyLam, EY; Wong, AK2010142
 
Regularization of inverse photomask synthesis to enhance manufacturabilityJia, N; Wong, AK; Lam, EY2009173
 
Robust mask design with defocus variation using inverse synthesisJia, N; Wong, AK; Lam, EY200859
 
Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithographyChan, SH; Wong, AK; Lam, EY2008170
 
ASPD: A prospective study of adequacy in asian patients on long term, small volume, continuous ambulatory peritoneal dialysisLam, MF; Tang, C; Wong, AK; Tong, KL; Yu, AW; Li, CS; Cheung, KO; Lai, KN2006105
 
Optimization of photomask design for reducing aberration-induced placement errorMak, GY; Wong, AK; Lam, EY2006595
 
Alternating phase-shifting mask design for low aberration sensitivityMak, GY; Wong, AK; Lam, EY200562
 
A report with consensus statements of the International Society of Nephrology 2004 Consensus Workshop on Prevention of Progression of Renal Disease, Hong Kong, June 29, 2004Li, PKT; Weening, JJ; Dirks, J; Lui, SL; Szeto, CC; Tang, S; Atkins, RC; Mitch, WE; Chow, KM; D'Amico, G; Freedman, BI; Harris, DC; Hooi, LS; De Jong, PE; KincaidSmith, P; Lai, KN; Lee, E; Li, FK; Lin, SY; Lo, WK; Mani, MK; Mathew, T; Murakami, M; Qian, JQ; Ramirez, S; Reiser, T; Tomino, Y; Tong, MK; Tsang, WK; Tungsanga, K; Wang, H; Wong, AK; Wong, KM; Yang, WC; De Zeeuw, D; Yu, AW; Memuzzi, G2005187
 
Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gatesWang, J; Wong, AK; Lam, EY2005757
 
Forbidden area avoidance with spacing technique for layout optimizationShi, S; Wong, AK; Ng, TS200465
 
Standard cell design with regularly-placed contacts and gatesWang, J; Wong, AK; Lam, EY200463
 
Standard cell layout with regular contact placementWang, J; Wong, AK; Lam, EY2004639
 
Performance optimization for gridded-layout standard cellsWang, J; Wong, AK; Lam, EY2004753
 
Alternating phase-shifting mask design for low aberration sensitivityMak, GY; Wong, AK; Lam, EY2004823
 
Microlithography: trends, challenges, solutions, and their impact on designWong, AK2003983
 
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