Browsing by Author Wong, AK

Jump to: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
Showing results 1 to 16 of 16
TitleAuthor(s)Issue DateViews
 
Alternating phase-shifting mask design for low aberration sensitivity
Journal:Journal of Microlithography, Microfabrication and Microsystems
2005
31
 
Alternating phase-shifting mask design for low aberration sensitivity
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
89
 
2006
44
Forbidden area avoidance with spacing technique for layout optimization
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
44
 
2008
54
 
2003
102
 
Nebulous hotspot and algorithm variability in computation lithography
Journal:Journal of Micro/ Nanolithography, MEMS, and MOEMS
2010
97
 
Optimization of photomask design for reducing aberration-induced placement error
Journal:IEEE Transactions on Semiconductor Manufacturing
2006
83
 
Performance optimization for gridded-layout standard cells
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
105
 
Regularization of inverse photomask synthesis to enhance manufacturability
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2009
81
2005
70
Robust mask design with defocus variation using inverse synthesis
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2008
26
 
2016
1
Standard cell design with regularly-placed contacts and gates
Proceeding/Conference:Proceedings of SPIE - The International Society for Optical Engineering
2004
39
 
Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates
Journal:Journal of Microlithography, Microfabrication and Microsystems
2005
74
 
Standard cell layout with regular contact placement
Journal:IEEE Transactions on Semiconductor Manufacturing
2004
136