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TypeTitleAuthor(s)YearViews
Ultra-shallow n +p junction formed by PH 3 and AsH 3 plasma immersion ion implantation
Journal:
Microelectronics Reliability
Publisher:
Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/microrel
Yang, BL; Cheung, NW; Denholm, S; Shao, J; Wong, H; Lai, PT; Cheng, YC2002130
 
An economical fabrication technique for SIMOX using plasma immersion ion implantation
Publisher:
IEEE.
Min, J; Chu, PK; Cheng, YC; Liu, JB; Iyer, SSK; Cheung, NW1995398
 
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