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Ultra-shallow n +p junction formed by PH 3 and AsH 3 plasma immersion ion implantationYang, BL; Cheung, NW; Denholm, S; Shao, J; Wong, H; Lai, PT; Cheng, YC200278
An economical fabrication technique for SIMOX using plasma immersion ion implantationMin, J; Chu, PK; Cheng, YC; Liu, JB; Iyer, SSK; Cheung, NW1995350
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