Showing results 13 to 21 of 21
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Title | Author(s) | Issue Date | Views | |
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Optimum mask and source patterns to print a given shape Journal:Journal of Microlithography, Microfabrication, and Microsystems | 2002 | 130 | ||
Optimum mask and source patterns to print a given shape Proceeding/Conference:Proceedings of SPIE | 2001 | |||
Placement sensitivity to aberration in optical imaging Proceeding/Conference:IEEE Conference on Electron Devices and Solid-State Circuits | 2003 | 144 | ||
Quantification of image quality Proceeding/Conference:SPIE - International Society for Optical Engineering. Proceedings | 2002 | |||
Sensitivity of 1D mask features towards aberration in photolithography Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | |||
Standard cell layout with grid-placed contacts Proceeding/Conference:Regional Inter-University Postgraduate Electrical and Electronic Engineering Conference | 2003 | |||
2002 | 108 | |||
Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks Proceeding/Conference:Proceedings of SPIE | 2002 | 112 | ||
2001 |