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	Title	Author(s)	Issue Date	Views
	Optimum mask and source patterns to print a given shape Journal:Journal of Microlithography, Microfabrication, and Microsystems	Rosenbluth, AE Bukofsky, S Fonseca, S Hibbs, M Lai, K Molless, A Singh, RN Wong, AKK	2002	130
	Optimum mask and source patterns to print a given shape Proceeding/Conference:Proceedings of SPIE	Rosenbluth, AE Bukofsky, SJ Hibbs, MS Lai, K Molless, AF Singh, RN Wong, AKK	2001

Showing results 1 to 2 of 2